Growth and Properties of LPCVD W-Si-N Layers

Svetlana Nikolajevna van Nieuwkasteele-Bystrova, J. Holleman, A.A. van Zomeren, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationSAFE'99
    Place of PublicationMierlo, The Netherlands
    Pages69-74
    Number of pages6
    Publication statusPublished - 24 Nov 1999

    Keywords

    • METIS-113899

    Cite this

    van Nieuwkasteele-Bystrova, S. N., Holleman, J., van Zomeren, A. A., & Woerlee, P. H. (1999). Growth and Properties of LPCVD W-Si-N Layers. In SAFE'99 (pp. 69-74). Mierlo, The Netherlands.