Growth of thin dense gas-tight (Tb,Y)-ZrO2 films by electrochemical vapour deposition

Guo-Zhong Cao, Joan Meijerink, Hendrik W. Brinkman, Karel J. de Vries, Anthonie J. Burggraaf

Research output: Contribution to journalArticleAcademicpeer-review

5 Citations (Scopus)

Abstract

Electrochemical vapour deposition has been applied to depositing thin, dense, gas-tight terbia- and yttria-stabilized zirconia films on porous ceramics using metal chlorides as precursors. (Tb,Y)-ZrO2 solid solutions have a fluorite-type structure and have a high mixed conductivity and oxygen semipermeability.
Original languageEnglish
Pages (from-to)773-774
Number of pages2
JournalJournal of materials science
Volume3
Issue number7
DOIs
Publication statusPublished - 1993

Keywords

  • METIS-106836

Fingerprint

Dive into the research topics of 'Growth of thin dense gas-tight (Tb,Y)-ZrO<sub>2</sub> films by electrochemical vapour deposition'. Together they form a unique fingerprint.

Cite this