Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED)

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

6 Citations (Scopus)
20 Downloads (Pure)

Abstract

In this chapter, reflection high-energy electron diffraction (RHEED) in combination with pulsed laser deposition (PLD) is described. Both the use of RHEED as a real-time rate-monitoring technique and methods to study nucleation and growth during PLD are discussed. After a brief introduction of RHEED, a case is made for the step density model to describe the intensity variations encountered during deposition. An overview of these intensity variations, the intensity response during an RHEED experiment as a result of various kinetic growth modes, is given
Original languageEnglish
Title of host publicationEpitaxial Growth of Complex Metal Oxides
EditorsG. Koster, M. Huijben, A.J.H.M. Rijnders
Place of PublicationCambridge, UK
PublisherWoodhead Publishing
Pages3-29
ISBN (Print)978-1-78242-245-7
DOIs
Publication statusPublished - 2015

Publication series

NameWoodhead Publishing Series in Electronic and Optical Materials
PublisherWoodhead Publishing

Keywords

  • 2024 OA procedure

Fingerprint

Dive into the research topics of 'Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED)'. Together they form a unique fingerprint.

Cite this