Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED)

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In this chapter, reflection high-energy electron diffraction (RHEED) in combination with pulsed laser deposition (PLD) is described. Both the use of RHEED as a real-time rate-monitoring technique and methods to study nucleation and growth during PLD are discussed. After a brief introduction of RHEED, a case is made for the step density model to describe the intensity variations encountered during deposition. An overview of these intensity variations, the intensity response during an RHEED experiment as a result of various kinetic growth modes, is given
Original languageEnglish
Title of host publicationEpitaxial Growth of Complex Metal Oxides
EditorsG. Koster, M. Huijben, A.J.H.M. Rijnders
Place of PublicationCambridge, UK
PublisherWoodhead Publishing
ISBN (Print)978-1-78242-245-7
Publication statusPublished - 2015

Publication series

NameWoodhead Publishing Series in Electronic and Optical Materials
PublisherWoodhead Publishing


  • METIS-310904
  • IR-96692

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