Helium Ion Microscopy

G. Hlawacek; V. Veligura; Raoul van Gastel; Bene Poelsema

doi:10.1116/1.4863676

Helium Ion Microscopy

G. Hlawacek, V. Veligura, Raoul van Gastel, Bene Poelsema

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Abstract

Helium Ion Microcopy (HIM) based on Gas Field Ion Sources (GFIS) represents a new ultra high resolution microscopy and nano-fabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nano-structures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gases such as Neon. A brief introduction of the underlying physics as well as a broad review of the applicability of the method is presented in this review.

Original language	English
Article number	020801
Pages (from-to)	-
Journal	Journal of vacuum science and technology. B: Microelectronics and nanometer structures
Volume	32
Issue number	2
DOIs	https://doi.org/10.1116/1.4863676
Publication status	Published - 2014

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Hlawacek2014heliumFinal published version, 3.24 MB

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Helium Ion Microscopy

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