High-definition micropatterning method for hard, stiff and brittle polymers

Yiping Zhao, R.K. Truckenmüller, Marloes Levers, Wei-shu Hua, Jan de Boer, Bernke Papenburg

    Research output: Contribution to journalArticleAcademicpeer-review

    6 Citations (Scopus)

    Abstract

    Polystyrene (PS) is the most commonly used material in cell culture devices, such as Petri dishes, culture flasks and well plates. Micropatterning of cell culture substrates can significantly affect cell-material interactions leading to an increasing interest in the fabrication of topographically micro-structured PS surfaces. However, the high stiffness combined with brittleness of PS (elastic modulus 3–3.5 GPa) makes high-quality patterning into PS difficult when standard hard molds, e.g. silicon and nickel, are used as templates. A new and robust scheme for easy processing of large-area high-density micro-patterning into PS film is established using nanoimprinting lithography and standard hot embossing techniques. Including an extra step through an intermediate PDMS mold alone does not result in faithful replication of the large area, high-density micropattern into PS. Here, we developed an approach using an additional intermediate mold out of OrmoStamp, which allows for high-quality and large-area micro-patterning into PS. OrmoStamp was originally developed for UV nanoimprint applications; this work demonstrates for the first time that OrmoStamp is a highly adequate material for micro-patterning of PS through hot embossing. Our proposed processing method achieves high-quality replication of micropatterns in PS, incorporating features with high aspect ratio (4:1, height:width), high density, and over a large pattern area. The proposed scheme can easily be adapted for other large-area and high-density micropatterns of PS, as well as other stiff and brittle polymers.
    Original languageEnglish
    Pages (from-to)558-564
    JournalMaterials science & engineering C
    Volume71
    DOIs
    Publication statusPublished - 1 Feb 2017

    Fingerprint

    Polystyrenes
    polystyrene
    Polymers
    polymers
    Cell culture
    embossing
    flasks
    brittleness
    parabolic reflectors
    Molds
    Silicon
    Brittleness
    Processing
    high aspect ratio
    Nickel
    Lithography
    Aspect ratio
    stiffness
    modulus of elasticity
    templates

    Cite this

    Zhao, Yiping ; Truckenmüller, R.K. ; Levers, Marloes ; Hua, Wei-shu ; de Boer, Jan ; Papenburg, Bernke. / High-definition micropatterning method for hard, stiff and brittle polymers. In: Materials science & engineering C. 2017 ; Vol. 71. pp. 558-564.
    @article{405f21a660b846de85800b5d27089910,
    title = "High-definition micropatterning method for hard, stiff and brittle polymers",
    abstract = "Polystyrene (PS) is the most commonly used material in cell culture devices, such as Petri dishes, culture flasks and well plates. Micropatterning of cell culture substrates can significantly affect cell-material interactions leading to an increasing interest in the fabrication of topographically micro-structured PS surfaces. However, the high stiffness combined with brittleness of PS (elastic modulus 3–3.5 GPa) makes high-quality patterning into PS difficult when standard hard molds, e.g. silicon and nickel, are used as templates. A new and robust scheme for easy processing of large-area high-density micro-patterning into PS film is established using nanoimprinting lithography and standard hot embossing techniques. Including an extra step through an intermediate PDMS mold alone does not result in faithful replication of the large area, high-density micropattern into PS. Here, we developed an approach using an additional intermediate mold out of OrmoStamp, which allows for high-quality and large-area micro-patterning into PS. OrmoStamp was originally developed for UV nanoimprint applications; this work demonstrates for the first time that OrmoStamp is a highly adequate material for micro-patterning of PS through hot embossing. Our proposed processing method achieves high-quality replication of micropatterns in PS, incorporating features with high aspect ratio (4:1, height:width), high density, and over a large pattern area. The proposed scheme can easily be adapted for other large-area and high-density micropatterns of PS, as well as other stiff and brittle polymers.",
    author = "Yiping Zhao and R.K. Truckenm{\"u}ller and Marloes Levers and Wei-shu Hua and {de Boer}, Jan and Bernke Papenburg",
    year = "2017",
    month = "2",
    day = "1",
    doi = "10.1016/j.msec.2016.11.004",
    language = "English",
    volume = "71",
    pages = "558--564",
    journal = "Materials science & engineering C",
    issn = "0928-4931",
    publisher = "Elsevier",

    }

    High-definition micropatterning method for hard, stiff and brittle polymers. / Zhao, Yiping; Truckenmüller, R.K.; Levers, Marloes; Hua, Wei-shu; de Boer, Jan; Papenburg, Bernke.

    In: Materials science & engineering C, Vol. 71, 01.02.2017, p. 558-564.

    Research output: Contribution to journalArticleAcademicpeer-review

    TY - JOUR

    T1 - High-definition micropatterning method for hard, stiff and brittle polymers

    AU - Zhao, Yiping

    AU - Truckenmüller, R.K.

    AU - Levers, Marloes

    AU - Hua, Wei-shu

    AU - de Boer, Jan

    AU - Papenburg, Bernke

    PY - 2017/2/1

    Y1 - 2017/2/1

    N2 - Polystyrene (PS) is the most commonly used material in cell culture devices, such as Petri dishes, culture flasks and well plates. Micropatterning of cell culture substrates can significantly affect cell-material interactions leading to an increasing interest in the fabrication of topographically micro-structured PS surfaces. However, the high stiffness combined with brittleness of PS (elastic modulus 3–3.5 GPa) makes high-quality patterning into PS difficult when standard hard molds, e.g. silicon and nickel, are used as templates. A new and robust scheme for easy processing of large-area high-density micro-patterning into PS film is established using nanoimprinting lithography and standard hot embossing techniques. Including an extra step through an intermediate PDMS mold alone does not result in faithful replication of the large area, high-density micropattern into PS. Here, we developed an approach using an additional intermediate mold out of OrmoStamp, which allows for high-quality and large-area micro-patterning into PS. OrmoStamp was originally developed for UV nanoimprint applications; this work demonstrates for the first time that OrmoStamp is a highly adequate material for micro-patterning of PS through hot embossing. Our proposed processing method achieves high-quality replication of micropatterns in PS, incorporating features with high aspect ratio (4:1, height:width), high density, and over a large pattern area. The proposed scheme can easily be adapted for other large-area and high-density micropatterns of PS, as well as other stiff and brittle polymers.

    AB - Polystyrene (PS) is the most commonly used material in cell culture devices, such as Petri dishes, culture flasks and well plates. Micropatterning of cell culture substrates can significantly affect cell-material interactions leading to an increasing interest in the fabrication of topographically micro-structured PS surfaces. However, the high stiffness combined with brittleness of PS (elastic modulus 3–3.5 GPa) makes high-quality patterning into PS difficult when standard hard molds, e.g. silicon and nickel, are used as templates. A new and robust scheme for easy processing of large-area high-density micro-patterning into PS film is established using nanoimprinting lithography and standard hot embossing techniques. Including an extra step through an intermediate PDMS mold alone does not result in faithful replication of the large area, high-density micropattern into PS. Here, we developed an approach using an additional intermediate mold out of OrmoStamp, which allows for high-quality and large-area micro-patterning into PS. OrmoStamp was originally developed for UV nanoimprint applications; this work demonstrates for the first time that OrmoStamp is a highly adequate material for micro-patterning of PS through hot embossing. Our proposed processing method achieves high-quality replication of micropatterns in PS, incorporating features with high aspect ratio (4:1, height:width), high density, and over a large pattern area. The proposed scheme can easily be adapted for other large-area and high-density micropatterns of PS, as well as other stiff and brittle polymers.

    U2 - 10.1016/j.msec.2016.11.004

    DO - 10.1016/j.msec.2016.11.004

    M3 - Article

    VL - 71

    SP - 558

    EP - 564

    JO - Materials science & engineering C

    JF - Materials science & engineering C

    SN - 0928-4931

    ER -