High efficiency structures EUV multilayer mirror for spectral filtering of long wavelengths

Qiushi Huang, Meint de Boer, Jonathan Barreaux, Robert van der Meer, Eric Louis, Frede Bijkerk

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Abstract

High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7% was achieved, which corresponds to 94% of the efficiency of a regular EUV multilayer mirror.
Original languageEnglish
Pages (from-to)19365-19374
Number of pages10
JournalOptics express
Volume22
Issue number16
DOIs
Publication statusPublished - 2014

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