High efficiency structures EUV multilayer mirror for spectral filtering of long wavelengths

Qiushi Huang, Meint de Boer, Jonathan Barreaux, Robert van der Meer, Eric Louis, Frede Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)

Abstract

High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7% was achieved, which corresponds to 94% of the efficiency of a regular EUV multilayer mirror.
Original languageEnglish
Pages (from-to)19365-19374
Number of pages10
JournalOptics express
Volume22
Issue number16
DOIs
Publication statusPublished - 2014

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mirrors
wavelengths
ultraviolet radiation
laminates
purity
retarding
broadband
reflectance
radiation
x rays

Cite this

Huang, Qiushi ; de Boer, Meint ; Barreaux, Jonathan ; van der Meer, Robert ; Louis, Eric ; Bijkerk, Frede. / High efficiency structures EUV multilayer mirror for spectral filtering of long wavelengths. In: Optics express. 2014 ; Vol. 22, No. 16. pp. 19365-19374.
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abstract = "High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7{\%} was achieved, which corresponds to 94{\%} of the efficiency of a regular EUV multilayer mirror.",
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High efficiency structures EUV multilayer mirror for spectral filtering of long wavelengths. / Huang, Qiushi; de Boer, Meint; Barreaux, Jonathan; van der Meer, Robert; Louis, Eric; Bijkerk, Frede.

In: Optics express, Vol. 22, No. 16, 2014, p. 19365-19374.

Research output: Contribution to journalArticleAcademicpeer-review

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AU - Huang, Qiushi

AU - de Boer, Meint

AU - Barreaux, Jonathan

AU - van der Meer, Robert

AU - Louis, Eric

AU - Bijkerk, Frede

PY - 2014

Y1 - 2014

N2 - High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7% was achieved, which corresponds to 94% of the efficiency of a regular EUV multilayer mirror.

AB - High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7% was achieved, which corresponds to 94% of the efficiency of a regular EUV multilayer mirror.

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