High energy low-dose implanted silicon annealed by transient RTA

I. Barsony, J.L.P. Heideman, J. Middelhoek, Hans Wallinga

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings symposium Mat.Res. Soc.
    Pages277-282
    Number of pages0
    Publication statusPublished - 1 Sep 1991

    Keywords

    • METIS-114014

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