High-energy low-dose implanted silicon annealed by transient RTA

I. Barsony

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    Original languageUndefined
    Title of host publicationMaterials Research Society Fall Meeting, paper A 9.6
    Place of PublicationBoston, USA
    Pages-
    Number of pages0
    Publication statusPublished - 15 Nov 1990

    Keywords

    • METIS-114018

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