High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology

F.S. Tan; D.J.W. Klunder; H. Kelderman; Hugo Hoekstra; A. Driessen

doi:10.1109/FOPC.2002.1015832

High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology

F.S. Tan, D.J.W. Klunder, H. Kelderman, Hugo Hoekstra, A. Driessen

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Citation (Scopus)

Abstract

A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si/sub 3/N/sub 4/-SiO/sub 2/ technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).

Original language	English
Title of host publication	Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components
Publisher	IEEE
Pages	228-232
Number of pages	5
ISBN (Print)	0-7803-7556-4
DOIs	https://doi.org/10.1109/FOPC.2002.1015832
Publication status	Published - 5 Jun 2002
Event	IEEE/LEOS Workshop on Fibre and Optical Passive Components, WFOPC 2002 - University of Glasgow, Glasgow, United Kingdom Duration: 5 Jun 2002 → 6 Jun 2002

Publication series

Name
Publisher	IEEE

Conference

Conference	IEEE/LEOS Workshop on Fibre and Optical Passive Components, WFOPC 2002
Abbreviated title	WFOPC
Country/Territory	United Kingdom
City	Glasgow
Period	5/06/02 → 6/06/02

Keywords

IR-44054
METIS-208287

Access to Document

10.1109/FOPC.2002.1015832

Cite this

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title = "High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology",

abstract = "A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si/sub 3/N/sub 4/-SiO/sub 2/ technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).",

keywords = "IR-44054, METIS-208287",

author = "F.S. Tan and D.J.W. Klunder and H. Kelderman and Hugo Hoekstra and A. Driessen",

year = "2002",

month = jun,

day = "5",

doi = "10.1109/FOPC.2002.1015832",

language = "English",

isbn = "0-7803-7556-4",

publisher = "IEEE",

pages = "228--232",

booktitle = "Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components",

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note = "IEEE/LEOS Workshop on Fibre and Optical Passive Components, WFOPC 2002, WFOPC ; Conference date: 05-06-2002 Through 06-06-2002",

}

Tan, FS, Klunder, DJW, Kelderman, H, Hoekstra, H & Driessen, A 2002, High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology. in Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components. IEEE, pp. 228-232, IEEE/LEOS Workshop on Fibre and Optical Passive Components, WFOPC 2002, Glasgow, United Kingdom, 5/06/02. https://doi.org/10.1109/FOPC.2002.1015832

High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology. / Tan, F.S.; Klunder, D.J.W.; Kelderman, H.; Hoekstra, Hugo; Driessen, A.

Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components. IEEE, 2002. p. 228-232.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology

AU - Tan, F.S.

AU - Klunder, D.J.W.

AU - Kelderman, H.

AU - Hoekstra, Hugo

AU - Driessen, A.

PY - 2002/6/5

Y1 - 2002/6/5

N2 - A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si/sub 3/N/sub 4/-SiO/sub 2/ technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).

AB - A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si/sub 3/N/sub 4/-SiO/sub 2/ technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).

KW - IR-44054

KW - METIS-208287

U2 - 10.1109/FOPC.2002.1015832

DO - 10.1109/FOPC.2002.1015832

M3 - Conference contribution

SN - 0-7803-7556-4

SP - 228

EP - 232

BT - Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components

PB - IEEE

T2 - IEEE/LEOS Workshop on Fibre and Optical Passive Components, WFOPC 2002

Y2 - 5 June 2002 through 6 June 2002

ER -

High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology

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Keywords

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