High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology

F.S. Tan, D.J.W. Klunder, H. Kelderman, Hugo Hoekstra, A. Driessen

    Research output: Contribution to conferencePosterOther research output

    Original languageUndefined
    Pages-
    Publication statusPublished - 3 Oct 2002
    EventMESA+ Day 2002 - CC complex, University of Twente, Enschede, Netherlands
    Duration: 3 Oct 20023 Oct 2002

    Conference

    ConferenceMESA+ Day 2002
    CountryNetherlands
    CityEnschede
    Period3/10/023/10/02
    Other(MESA+ Meeting/Dag)

    Keywords

    • METIS-208371

    Cite this

    Tan, F. S., Klunder, D. J. W., Kelderman, H., Hoekstra, H., & Driessen, A. (2002). High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology. -. Poster session presented at MESA+ Day 2002, Enschede, Netherlands.
    Tan, F.S. ; Klunder, D.J.W. ; Kelderman, H. ; Hoekstra, Hugo ; Driessen, A. / High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology. Poster session presented at MESA+ Day 2002, Enschede, Netherlands.
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    keywords = "METIS-208371",
    author = "F.S. Tan and D.J.W. Klunder and H. Kelderman and Hugo Hoekstra and A. Driessen",
    year = "2002",
    month = "10",
    day = "3",
    language = "Undefined",
    pages = "--",
    note = "null ; Conference date: 03-10-2002 Through 03-10-2002",

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    Tan, FS, Klunder, DJW, Kelderman, H, Hoekstra, H & Driessen, A 2002, 'High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology' MESA+ Day 2002, Enschede, Netherlands, 3/10/02 - 3/10/02, pp. -.

    High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology. / Tan, F.S.; Klunder, D.J.W.; Kelderman, H.; Hoekstra, Hugo; Driessen, A.

    2002. - Poster session presented at MESA+ Day 2002, Enschede, Netherlands.

    Research output: Contribution to conferencePosterOther research output

    TY - CONF

    T1 - High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology

    AU - Tan, F.S.

    AU - Klunder, D.J.W.

    AU - Kelderman, H.

    AU - Hoekstra, Hugo

    AU - Driessen, A.

    PY - 2002/10/3

    Y1 - 2002/10/3

    KW - METIS-208371

    M3 - Poster

    SP - -

    ER -

    Tan FS, Klunder DJW, Kelderman H, Hoekstra H, Driessen A. High finesse vertically coupled waveguide-microring resonators based on Si3N4-SiO2 technology. 2002. Poster session presented at MESA+ Day 2002, Enschede, Netherlands.