Abstract
A method is presented by which the implantation damage induced transient enhanced diffusion of boron and phosphorus is used to fabricate high-frequency SiGe HBT's with implanted emitters. A device with 30 nm basewidth and fT= 44 GHz is demonstrated.
Original language | English |
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Title of host publication | ESSDERC 1996 - Proceedings of the 26th European Solid State Device Research Conference |
Editors | Massimo Rudan, Giorgio Baccarani |
Place of Publication | Piscataway, NJ |
Publisher | IEEE |
Pages | 469-472 |
Number of pages | 4 |
ISBN (Print) | 9782863321966 |
Publication status | Published - 1 Jan 1996 |
Externally published | Yes |
Event | 26th European Solid State Device Research Conference, ESSDERC 1996 - Bologna, Italy Duration: 9 Sept 1996 → 11 Sept 1996 Conference number: 26 |
Conference
Conference | 26th European Solid State Device Research Conference, ESSDERC 1996 |
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Abbreviated title | ESSDERC |
Country/Territory | Italy |
City | Bologna |
Period | 9/09/96 → 11/09/96 |