High-power EUV lithography: spectral purity and imaging performance

Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Muharrem Bayraktar, Robert de Kruif, Natalia Davydova

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  • 2020

    Spectral purity performance of high-power EUV systems

    van de Kerkhof, M., Liu, F., Meeuwissen, M., Zhang, X., de Kruif, R., Davydova, N., Schiffelers, G., Wählish, F., van Setten, E., Varenkamp, W., Ricken, K., de Winter, L., McNamara, J. & Bayraktar, M., 23 Mar 2020, Extreme Ultraviolet (EUV) Lithography XI. Felix, N. M. & Lio, A. (eds.). SPIE, Vol. 11323. 16 p. 1132321. (SPIE Conference Proceedings; vol. 1323).

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    8 Citations (Scopus)
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