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High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography
Andreas Schmidt, Gerhard Himmelsbach, Regina Lüttge, Dieter Adam, Falk Hoke, Hartmut Schacke (Corresponding Author), Nicola Belic, Hans Hartmann, Frank Burkhard, Hermann Wolf
Research output: Contribution to journal › Article › Academic › peer-review
10
Citations
(Scopus)