High Quality Silicon Oxide Deposited with a Multipolar Electron Cyclotron Resonance Plasma Source

I.G. Isai, Alexeij Y. Kovalgin, J. Holleman, P.H. Woerlee, Hans Wallinga

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the 198th Meeting of the Electrochemical Society
    Place of PublicationPhoenix, USA
    Publication statusPublished - 22 Oct 2000


    • METIS-113907

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