High Quality Silicon Oxide Deposited with a Multipolar Electron Cyclotron Resonance Plasma Source

I.G. Isai, Alexeij Y. Kovalgin, J. Holleman, P.H. Woerlee, Hans Wallinga

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of the 198th Meeting of the Electrochemical Society
Place of Publication	Phoenix, USA
Pages	-
Publication status	Published - 22 Oct 2000

Keywords

@inproceedings{daf78574ef174787a175904b861449b7,

title = "High Quality Silicon Oxide Deposited with a Multipolar Electron Cyclotron Resonance Plasma Source",

keywords = "METIS-113907",

author = "I.G. Isai and Kovalgin, \{Alexeij Y.\} and J. Holleman and P.H. Woerlee and Hans Wallinga",

year = "2000",

month = oct,

day = "22",

language = "Undefined",

pages = "--",

booktitle = "Proceedings of the 198th Meeting of the Electrochemical Society",

}

TY - GEN

T1 - High Quality Silicon Oxide Deposited with a Multipolar Electron Cyclotron Resonance Plasma Source

AU - Isai, I.G.

AU - Kovalgin, Alexeij Y.

AU - Holleman, J.

AU - Woerlee, P.H.

AU - Wallinga, Hans

PY - 2000/10/22

Y1 - 2000/10/22

KW - METIS-113907

M3 - Conference contribution

SP - -

BT - Proceedings of the 198th Meeting of the Electrochemical Society

CY - Phoenix, USA

ER -