High reflectance multilayer coating technology for 3100 EUVL projection optics

E.D. van Hattum, Eric Louis, A. van der Westen, P. Salle, E. Zoethout, G. von Blanckenhage, H. Enkish, Stephan Müllender, Frederik Bijkerk

Research output: Contribution to conferencePoster

Original languageEnglish
Pages-
Publication statusPublished - 21 Feb 2010
EventSPIE Advanced Lithography 2010 - San Jose Convention Center, San Jose, United States
Duration: 21 Feb 201026 Feb 2010
https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Conference

ConferenceSPIE Advanced Lithography 2010
CountryUnited States
CitySan Jose
Period21/02/1026/02/10
Internet address

Keywords

  • METIS-270405

Cite this

van Hattum, E. D., Louis, E., van der Westen, A., Salle, P., Zoethout, E., von Blanckenhage, G., ... Bijkerk, F. (2010). High reflectance multilayer coating technology for 3100 EUVL projection optics. -. Poster session presented at SPIE Advanced Lithography 2010, San Jose, United States.