High reflectance multilayer coating technology for 3100 EUVL projection optics

E.D. van Hattum; Eric Louis; A. van der Westen; P. Salle; E. Zoethout; G. von Blanckenhage; H. Enkish; Stephan Müllender; Frederik Bijkerk

High reflectance multilayer coating technology for 3100 EUVL projection optics

E.D. van Hattum, Eric Louis, A. van der Westen, P. Salle, E. Zoethout, G. von Blanckenhage, H. Enkish, Stephan Müllender, Frederik Bijkerk

Laser Physics & Nonlinear Optics

Research output: Contribution to conference › Poster › Other research output

Original language	English
Pages	-
Publication status	Published - 21 Feb 2010
Event	SPIE Advanced Lithography 2010 - San Jose Convention Center, San Jose, United States Duration: 21 Feb 2010 → 26 Feb 2010 https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Conference

Conference	SPIE Advanced Lithography 2010
Country/Territory	United States
City	San Jose
Period	21/02/10 → 26/02/10
Internet address	https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Keywords

METIS-270405

Cite this

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title = "High reflectance multilayer coating technology for 3100 EUVL projection optics",

keywords = "METIS-270405",

author = "{van Hattum}, E.D. and Eric Louis and {van der Westen}, A. and P. Salle and E. Zoethout and {von Blanckenhage}, G. and H. Enkish and Stephan M{\"u}llender and Frederik Bijkerk",

year = "2010",

month = feb,

day = "21",

language = "English",

pages = "--",

note = "SPIE Advanced Lithography 2010 ; Conference date: 21-02-2010 Through 26-02-2010",

url = "https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010",

}

TY - CONF

T1 - High reflectance multilayer coating technology for 3100 EUVL projection optics

AU - van Hattum, E.D.

AU - Louis, Eric

AU - van der Westen, A.

AU - Salle, P.

AU - Zoethout, E.

AU - von Blanckenhage, G.

AU - Enkish, H.

AU - Müllender, Stephan

AU - Bijkerk, Frederik

PY - 2010/2/21

Y1 - 2010/2/21

KW - METIS-270405

M3 - Poster

SP - -

T2 - SPIE Advanced Lithography 2010

Y2 - 21 February 2010 through 26 February 2010

ER -