High reflectance multilayer coating technology for 3100 EUVL projection optics

E.D. van Hattum; Eric Louis; A. van der Westen; P. Salle; E. Zoethout; G. von Blanckenhage; H. Enkish; Stephan Müllender; Frederik Bijkerk

High reflectance multilayer coating technology for 3100 EUVL projection optics

E.D. van Hattum
, Eric Louis
, A. van der Westen
, P. Salle
, E. Zoethout
, G. von Blanckenhage
, H. Enkish
, Stephan Müllender
, Frederik Bijkerk

Laser Physics & Nonlinear Optics

Research output: Contribution to conference › Poster › Other research output

Original language	English
Pages	-
Publication status	Published - 21 Feb 2010
Event	SPIE Advanced Lithography 2010 - San Jose Convention Center, San Jose, United States Duration: 21 Feb 2010 → 26 Feb 2010 https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Conference

Conference	SPIE Advanced Lithography 2010
Country/Territory	United States
City	San Jose
Period	21/02/10 → 26/02/10
Internet address	https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010

Keywords

METIS-270405

Cite this

@conference{3f7ec7051f3346c6a14d586629de1acf,

title = "High reflectance multilayer coating technology for 3100 EUVL projection optics",

keywords = "METIS-270405",

author = "\{van Hattum\}, E.D. and Eric Louis and \{van der Westen\}, A. and P. Salle and E. Zoethout and \{von Blanckenhage\}, G. and H. Enkish and Stephan M{\"u}llender and Frederik Bijkerk",

year = "2010",

month = feb,

day = "21",

language = "English",

pages = "--",

note = "SPIE Advanced Lithography 2010 ; Conference date: 21-02-2010 Through 26-02-2010",

url = "https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/advanced-lithography-2010",

}

TY - CONF

T1 - High reflectance multilayer coating technology for 3100 EUVL projection optics

AU - van Hattum, E.D.

AU - Louis, Eric

AU - van der Westen, A.

AU - Salle, P.

AU - Zoethout, E.

AU - von Blanckenhage, G.

AU - Enkish, H.

AU - Müllender, Stephan

AU - Bijkerk, Frederik

PY - 2010/2/21

Y1 - 2010/2/21

KW - METIS-270405

M3 - Poster

SP - -

T2 - SPIE Advanced Lithography 2010

Y2 - 21 February 2010 through 26 February 2010

ER -