High reflectance multilayers for EUVL HVM-projection optics

Eric Louis, E.D. van Hattum, S. Alonso van der Westen, P. Sallé, Kees Grootkarzijn, E. Zoethout, Frederik Bijkerk, G. von Blanckenhagen, Stephan Müllender

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

6 Citations (Scopus)
6 Downloads (Pure)


Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.
Original languageEnglish
Title of host publicationExtreme Ultraviolet (EUV) Lithography
EditorsBruno M. La Fontaine
Place of PublicationSan Jose, USA
Number of pages5
ISBN (Print)9780819480507
Publication statusPublished - 22 Mar 2010
EventSPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010 - San Jose, United States
Duration: 22 Feb 201025 Feb 2010
Conference number: 1

Publication series

NameProceedings of SPIE
PublisherSPIE--The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferenceSPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010
Country/TerritoryUnited States
CitySan Jose


  • IR-77697


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