Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.
|Name||Proceedings of SPIE|
|Publisher||SPIE--The International Society for Optical Engineering|
|Conference||SPIE Conference on Extreme Ultraviolet (EUV) Lithography I, 2010|
|Period||22/02/10 → 25/02/10|