High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography

X. Duan; Yiping Zhao; A. Perl; Johan W. Berenschot; David Reinhoudt; Jurriaan Huskens

doi:10.1002/adma.200803809

High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography

X. Duan
, Yiping Zhao
, A. Perl
, Johan W. Berenschot
, David Reinhoudt
, Jurriaan Huskens

Research output: Contribution to journal › Article › Academic › peer-review

24 Citations (Scopus)

449 Downloads (Pure)

Abstract

Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps.

Original language	English
Article number	10.1002/adma.200803809
Pages (from-to)	2798-2802
Number of pages	5
Journal	Advanced materials
Volume	21
Issue number	27
DOIs	https://doi.org/10.1002/adma.200803809
Publication status	Published - 10 Jul 2009

Keywords

EWI-16079
IR-67992
METIS-259871

Access to Document

10.1002/adma.200803809

Hig_resolution_contact_printing-Yiping

http://eprints.eemcs.utwente.nl/secure2/16079/01/Hig_resolution_contact_printing-Yiping.pdf

Cite this

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title = "High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography",

abstract = "Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps.",

keywords = "EWI-16079, IR-67992, METIS-259871",

author = "X. Duan and Yiping Zhao and A. Perl and Berenschot, \{Johan W.\} and David Reinhoudt and Jurriaan Huskens",

year = "2009",

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doi = "10.1002/adma.200803809",

language = "English",

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AU - Duan, X.

AU - Zhao, Yiping

AU - Perl, A.

AU - Berenschot, Johan W.

AU - Reinhoudt, David

AU - Huskens, Jurriaan

PY - 2009/7/10

Y1 - 2009/7/10

N2 - Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps.

AB - Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps.

KW - EWI-16079

KW - IR-67992

KW - METIS-259871

U2 - 10.1002/adma.200803809

DO - 10.1002/adma.200803809

M3 - Article

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IS - 27

M1 - 10.1002/adma.200803809

ER -

High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography

Abstract

Keywords

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