High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through

G.J. Burger, E.J.T. Smulders, Johan W. Berenschot, Theodorus S.J. Lammerink, J.H.J. Fluitman, S. Imai

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationStockholm
    Publication statusPublished - 25 Jun 1995


    • METIS-114932

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