High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through

G.J. Burger, E.J.T. Smulders, Johan W. Berenschot, Theodorus S.J. Lammerink, J.H.J. Fluitman, S. Imai

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationStockholm
    Publication statusPublished - 25 Jun 1995

    Keywords

    • METIS-114932

    Cite this

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    title = "High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through",
    keywords = "METIS-114932",
    author = "G.J. Burger and E.J.T. Smulders and Berenschot, {Johan W.} and Lammerink, {Theodorus S.J.} and J.H.J. Fluitman and S. Imai",
    year = "1995",
    month = "6",
    day = "25",
    language = "Undefined",
    type = "Other",

    }

    High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through. / Burger, G.J.; Smulders, E.J.T.; Berenschot, Johan W.; Lammerink, Theodorus S.J.; Fluitman, J.H.J.; Imai, S.

    Stockholm. 1995, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through

    AU - Burger, G.J.

    AU - Smulders, E.J.T.

    AU - Berenschot, Johan W.

    AU - Lammerink, Theodorus S.J.

    AU - Fluitman, J.H.J.

    AU - Imai, S.

    PY - 1995/6/25

    Y1 - 1995/6/25

    KW - METIS-114932

    M3 - Other contribution

    CY - Stockholm

    ER -