Skip to main navigation Skip to search Skip to main content

High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through

  • G.J. Burger
  • , E.J.T. Smulders
  • , Johan W. Berenschot
  • , Theodorus S.J. Lammerink
  • , J.H.J. Fluitman
  • , S. Imai

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationStockholm
    Publication statusPublished - 25 Jun 1995

    Keywords

    • METIS-114932

    Cite this