High-Tc thin films prepared by laser ablation: material distribution and droplet problem

D.H.A. Blank, R.P.J. IJsselsteijn, P.G. Out, H.J.H. Kuiper, J. Flokstra, H. Rogalla

Research output: Contribution to journalArticleAcademicpeer-review

31 Citations (Scopus)
37 Downloads (Pure)

Abstract

The lateral material distribution of laser-deposited YBa2Cu3O7−δ films and the density of droplets coming from the target were studied by varying the laser pulse energy, the laser spot size and the target-to-substrate distance. Silicon wafers at ambient temperature were used as substrates to guarantee a large sticking coefficient of the particles. The deposition rate is found to depend linearly on the laser energy density E and quadratically on the spot size S at the target, whereas the droplet density is slightly dependent on E and increases linearly with 1/S, yielding a threshold energy of 0.9 J cm−2. With a laser spot size of 7.15 mm2 and a laser energy density of 1.2 J cm−2, we were able to reduce the number of droplets to one to two per 500 μm2 for a high quality high film with a typical thickness of 100 nm.
Original languageEnglish
Pages (from-to)67-74
Number of pages8
JournalMaterials science & engineering B
Volume13
Issue number1
DOIs
Publication statusPublished - 1992

Fingerprint Dive into the research topics of 'High-Tc thin films prepared by laser ablation: material distribution and droplet problem'. Together they form a unique fingerprint.

  • Cite this