High-temperature stability of thermoelectric Ca3Co4O9 thin films

Peter Brinks, N. Van Nong, N. Pryds, Augustinus J.H.M. Rijnders, Mark Huijben

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An enhanced thermal stability in thermoelectric Ca3Co4O9 thin films up to 550 °C in an oxygen rich environment was demonstrated by high-temperature electrical and X-ray diffraction measurements. In contrast to generally performed heating in helium gas, it is shown that an oxygen/helium mixture provides sufficient thermal contact, while preventing the previously disregarded formation of oxygen vacancies. Combining thermal cycling with electrical measurements proves to be a powerful tool to study the real intrinsic thermoelectric behaviour of oxide thin films at elevated temperatures
Original languageUndefined
Article number143903
Pages (from-to)-
Number of pages4
JournalApplied physics letters
Issue number143903
Publication statusPublished - 2015


  • METIS-310457
  • IR-96682

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