High temperature surface imaging using atomic force microscopy

Joska Johannes Broekmaat, Alexander Brinkman, David H.A. Blank, Augustinus J.H.M. Rijnders

Research output: Contribution to journalArticleAcademicpeer-review

27 Citations (Scopus)


Atomic force microscopy (AFM) is one of the most important tools in nanotechnology and surface science. Because of recent developments, nowadays, it is also used to study dynamic processes, such as thin film growth and surface reaction mechanisms. These processes often take place at high temperature and there is a clear need to extend the current operating temperature range of AFM. This letter describes a heating stage and a modified AFM that extends the maximum operating temperature to 750°C. Atomic step resolution is obtained up to 500°C in ambient and even up to 750°C in vacuum.
Original languageUndefined
Pages (from-to)043102-
Number of pages3
JournalApplied physics letters
Issue number4
Publication statusPublished - 2008


  • METIS-250706
  • IR-59168

Cite this