Highly oriented poly(di-n-alkylsilylene) films on oriented PTFE substrates

Holger Frey, Sergej Sheiko, Martin Möller, Jean-Claude Wittmann, Bernard Lot

Research output: Contribution to journalArticleAcademicpeer-review

33 Citations (Scopus)
159 Downloads (Pure)


Highly oriented polysilylene layers have potential applications in electrophotography, nonlinear optics, display fabrication, and microlithography. The preparation of such layers by crystallization on a highly oriented PTFE substrate is reported, and their assessment by optical birefringence, electron diffraction and dichroic infrared experiments described. Why this orientation technique works is not yet clear, especially as it can be applied to poly(di-n-alkylsilylen)s with different crystal structures. Several possible underlying mechanisms are discussed.
Original languageEnglish
Pages (from-to)917-919
JournalAdvanced materials
Issue number12
Publication statusPublished - 1993


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