Highly oriented poly(di-n-alkylsilylene) films on oriented PTFE substrates

Holger Frey; Sergej Sheiko; Martin Möller; Jean-Claude Wittmann; Bernard Lot

doi:10.1002/adma.19930051208

Highly oriented poly(di-n-alkylsilylene) films on oriented PTFE substrates

Holger Frey
, Sergej Sheiko
, Martin Möller
, Jean-Claude Wittmann
, Bernard Lot

Materials Science and Technology of Polymers

Research output: Contribution to journal › Article › Academic › peer-review

33 Citations (Scopus)

226 Downloads (Pure)

Abstract

Highly oriented polysilylene layers have potential applications in electrophotography, nonlinear optics, display fabrication, and microlithography. The preparation of such layers by crystallization on a highly oriented PTFE substrate is reported, and their assessment by optical birefringence, electron diffraction and dichroic infrared experiments described. Why this orientation technique works is not yet clear, especially as it can be applied to poly(di-n-alkylsilylen)s with different crystal structures. Several possible underlying mechanisms are discussed.

Original language	English
Pages (from-to)	917-919
Journal	Advanced materials
Volume	5
Issue number	12
DOIs	https://doi.org/10.1002/adma.19930051208
Publication status	Published - 1993

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title = "Highly oriented poly(di-n-alkylsilylene) films on oriented PTFE substrates",

abstract = "Highly oriented polysilylene layers have potential applications in electrophotography, nonlinear optics, display fabrication, and microlithography. The preparation of such layers by crystallization on a highly oriented PTFE substrate is reported, and their assessment by optical birefringence, electron diffraction and dichroic infrared experiments described. Why this orientation technique works is not yet clear, especially as it can be applied to poly(di-n-alkylsilylen)s with different crystal structures. Several possible underlying mechanisms are discussed.",

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doi = "10.1002/adma.19930051208",

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AU - Frey, Holger

AU - Sheiko, Sergej

AU - Möller, Martin

AU - Wittmann, Jean-Claude

AU - Lot, Bernard

PY - 1993

Y1 - 1993

N2 - Highly oriented polysilylene layers have potential applications in electrophotography, nonlinear optics, display fabrication, and microlithography. The preparation of such layers by crystallization on a highly oriented PTFE substrate is reported, and their assessment by optical birefringence, electron diffraction and dichroic infrared experiments described. Why this orientation technique works is not yet clear, especially as it can be applied to poly(di-n-alkylsilylen)s with different crystal structures. Several possible underlying mechanisms are discussed.

AB - Highly oriented polysilylene layers have potential applications in electrophotography, nonlinear optics, display fabrication, and microlithography. The preparation of such layers by crystallization on a highly oriented PTFE substrate is reported, and their assessment by optical birefringence, electron diffraction and dichroic infrared experiments described. Why this orientation technique works is not yet clear, especially as it can be applied to poly(di-n-alkylsilylen)s with different crystal structures. Several possible underlying mechanisms are discussed.

U2 - 10.1002/adma.19930051208

DO - 10.1002/adma.19930051208

M3 - Article

SN - 0935-9648

VL - 5

SP - 917

EP - 919

JO - Advanced materials

JF - Advanced materials

IS - 12

ER -

Highly oriented poly(di-n-alkylsilylene) films on oriented PTFE substrates

Abstract

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