Hot-Wire generated atomic hydrogen and its impact on thermal ALD in TiCl4/NH3 System

    Research output: Contribution to journalArticleAcademicpeer-review

    10 Citations (Scopus)

    Abstract

    We present the generation of atomic hydrogen made by the dissociation of molecular hydrogen upon collision with a tungsten (W) filament kept at a high temperature (T ≈ 1600–1900◦C). We demonstrate the ability to create atomic hydrogen and to introduce it in short pulses in experiments on etching of tellurium (Te) films. We further utilize the generated atomic hydrogen (H) to explore its impact on surface reactions in the TiCl4/NH3 precursor system. Atomic hydrogen is introduced in pulses additionally to TiCl4 and NH3 with different pulse sequences. For the TiCl4/NH3/H sequence, there is no influence on the process compared to the ALD without H-pulses. The growth rate remains at 0.02 nm/cycle and the oxygen (residual gas) content - at 3–5 at%. For the TiCl4/H/NH3 pulse sequence, the growth rate decreases to 0.01 nm/cycle and the oxygen content increases to 30–35 at%. Only TiCl4/H pulses result in no growth after the formation of approximately one monolayer. Similar effect occurs after introducing NH3 via the hot filament, pointing to the decomposition of NH3 and the formation of atomic hydrogen.
    Original languageUndefined
    Pages (from-to)149-155
    Number of pages7
    JournalECS journal of solid state science and technology
    Volume2
    Issue number4
    DOIs
    Publication statusPublished - 8 Feb 2013

    Keywords

    • EWI-23100
    • IR-84273
    • METIS-296315

    Cite this

    @article{ceaf0da39002407788de35def831cef5,
    title = "Hot-Wire generated atomic hydrogen and its impact on thermal ALD in TiCl4/NH3 System",
    abstract = "We present the generation of atomic hydrogen made by the dissociation of molecular hydrogen upon collision with a tungsten (W) filament kept at a high temperature (T ≈ 1600–1900◦C). We demonstrate the ability to create atomic hydrogen and to introduce it in short pulses in experiments on etching of tellurium (Te) films. We further utilize the generated atomic hydrogen (H) to explore its impact on surface reactions in the TiCl4/NH3 precursor system. Atomic hydrogen is introduced in pulses additionally to TiCl4 and NH3 with different pulse sequences. For the TiCl4/NH3/H sequence, there is no influence on the process compared to the ALD without H-pulses. The growth rate remains at 0.02 nm/cycle and the oxygen (residual gas) content - at 3–5 at{\%}. For the TiCl4/H/NH3 pulse sequence, the growth rate decreases to 0.01 nm/cycle and the oxygen content increases to 30–35 at{\%}. Only TiCl4/H pulses result in no growth after the formation of approximately one monolayer. Similar effect occurs after introducing NH3 via the hot filament, pointing to the decomposition of NH3 and the formation of atomic hydrogen.",
    keywords = "EWI-23100, IR-84273, METIS-296315",
    author = "{Van Hao}, B. and Kovalgin, {Alexeij Y.} and Aarnink, {Antonius A.I.} and Wolters, {Robertus A.M.}",
    note = "eemcs-eprint-23100",
    year = "2013",
    month = "2",
    day = "8",
    doi = "10.1149/2.015304jss",
    language = "Undefined",
    volume = "2",
    pages = "149--155",
    journal = "ECS journal of solid state science and technology",
    issn = "2162-8769",
    publisher = "The Electrochemical Society Inc.",
    number = "4",

    }

    Hot-Wire generated atomic hydrogen and its impact on thermal ALD in TiCl4/NH3 System. / Van Hao, B.; Kovalgin, Alexeij Y.; Aarnink, Antonius A.I.; Wolters, Robertus A.M.

    In: ECS journal of solid state science and technology, Vol. 2, No. 4, 08.02.2013, p. 149-155.

    Research output: Contribution to journalArticleAcademicpeer-review

    TY - JOUR

    T1 - Hot-Wire generated atomic hydrogen and its impact on thermal ALD in TiCl4/NH3 System

    AU - Van Hao, B.

    AU - Kovalgin, Alexeij Y.

    AU - Aarnink, Antonius A.I.

    AU - Wolters, Robertus A.M.

    N1 - eemcs-eprint-23100

    PY - 2013/2/8

    Y1 - 2013/2/8

    N2 - We present the generation of atomic hydrogen made by the dissociation of molecular hydrogen upon collision with a tungsten (W) filament kept at a high temperature (T ≈ 1600–1900◦C). We demonstrate the ability to create atomic hydrogen and to introduce it in short pulses in experiments on etching of tellurium (Te) films. We further utilize the generated atomic hydrogen (H) to explore its impact on surface reactions in the TiCl4/NH3 precursor system. Atomic hydrogen is introduced in pulses additionally to TiCl4 and NH3 with different pulse sequences. For the TiCl4/NH3/H sequence, there is no influence on the process compared to the ALD without H-pulses. The growth rate remains at 0.02 nm/cycle and the oxygen (residual gas) content - at 3–5 at%. For the TiCl4/H/NH3 pulse sequence, the growth rate decreases to 0.01 nm/cycle and the oxygen content increases to 30–35 at%. Only TiCl4/H pulses result in no growth after the formation of approximately one monolayer. Similar effect occurs after introducing NH3 via the hot filament, pointing to the decomposition of NH3 and the formation of atomic hydrogen.

    AB - We present the generation of atomic hydrogen made by the dissociation of molecular hydrogen upon collision with a tungsten (W) filament kept at a high temperature (T ≈ 1600–1900◦C). We demonstrate the ability to create atomic hydrogen and to introduce it in short pulses in experiments on etching of tellurium (Te) films. We further utilize the generated atomic hydrogen (H) to explore its impact on surface reactions in the TiCl4/NH3 precursor system. Atomic hydrogen is introduced in pulses additionally to TiCl4 and NH3 with different pulse sequences. For the TiCl4/NH3/H sequence, there is no influence on the process compared to the ALD without H-pulses. The growth rate remains at 0.02 nm/cycle and the oxygen (residual gas) content - at 3–5 at%. For the TiCl4/H/NH3 pulse sequence, the growth rate decreases to 0.01 nm/cycle and the oxygen content increases to 30–35 at%. Only TiCl4/H pulses result in no growth after the formation of approximately one monolayer. Similar effect occurs after introducing NH3 via the hot filament, pointing to the decomposition of NH3 and the formation of atomic hydrogen.

    KW - EWI-23100

    KW - IR-84273

    KW - METIS-296315

    U2 - 10.1149/2.015304jss

    DO - 10.1149/2.015304jss

    M3 - Article

    VL - 2

    SP - 149

    EP - 155

    JO - ECS journal of solid state science and technology

    JF - ECS journal of solid state science and technology

    SN - 2162-8769

    IS - 4

    ER -