How bubbles (can) clean

Claus Dieter Ohl*, Rory Dijkink, Manish Arora, Detlef Lohse

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS 2006 - Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS)
PublisherTrans Tech Publications Ltd
Pages151-153
Number of pages3
ISBN (Print)3908451469, 9783908451464
Publication statusPublished - 1 Jan 2008
Event8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006 - Antwerp, Belgium
Duration: 18 Sep 200620 Sep 2006
Conference number: 8

Publication series

NameSolid State Phenomena
Volume134
ISSN (Print)1012-0394

Conference

Conference8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006
Abbreviated titleUCPSS 2006
CountryBelgium
CityAntwerp
Period18/09/0620/09/06

Keywords

  • Cavitation
  • Flow visualization
  • Jet

Cite this

Ohl, C. D., Dijkink, R., Arora, M., & Lohse, D. (2008). How bubbles (can) clean. In Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS 2006 - Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) (pp. 151-153). (Solid State Phenomena; Vol. 134). Trans Tech Publications Ltd.