How Lithography Enables Moore's Law

J. P.H. Benschop*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

Abstract

Moore's Law sets the pace for the electronics industry, delivering increasing computing capabilities at stable cost. This was driven by the steady pace of the increase of components in an integrated circuit (IC), which has to a large extent been enabled by optical lithography printing increasingly smaller electronic features on a silicon wafer. This chapter quantifies what the contribution of lithography to Moore's Law has been in the past and then discusses the future lithography options to extend Moore's Law into the future. Optical lithography has always been the workhorse for IC manufacturing. The next step for optical lithography is extreme ultraviolet (EUV), which will greatly simplify patterning and thus promises faster yield ramp and lower cost. The alternative patterning techniques, Directed self-assembly (DSA) still needs optical lithography to guide the patterns and should thus be seen as a complementary technology.

Original languageEnglish
Title of host publicationFuture Trends in Microelectronics: Journey into the Unknown
EditorsSerge Luryi, Jimmy Xu, Alexander Zaslavsky
PublisherWiley
Pages23-34
Number of pages12
ISBN (Electronic)9781119069225
ISBN (Print)9781119069119
DOIs
Publication statusPublished - 19 Sep 2016
Externally publishedYes

Keywords

  • Computing capabilities
  • Electronics industry
  • Extreme ultraviolet
  • Integrated circuit
  • Moore's Law
  • Optical lithography
  • Silicon wafer

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  • Cite this

    Benschop, J. P. H. (2016). How Lithography Enables Moore's Law. In S. Luryi, J. Xu, & A. Zaslavsky (Eds.), Future Trends in Microelectronics: Journey into the Unknown (pp. 23-34). Wiley. https://doi.org/10.1002/9781119069225.ch1-2