Abstract
Mo/Si multilayer mirrors were exposed to deuterium ions with well-defined energies in order to gain insight into the effects of Extreme UV light driven plasma generation on reflective elements in commercial lithography equipment. Post-irradiation analysis by Rutherford Backscattering Spectrometry showed erosion of both Mo and Si layers for the highest energy 50 eV/D and exposure time 5.4 × 104 s. Nuclear Reaction Analysis revealed detectable deuterium retention for energies ⩾25 eV/D. Surface analysis by X-ray Photoelectron Spectroscopy showed erosion of the first Si layer for energies ⩾5 eV/D. Inferences on the spatial distribution of trapped deuterium are made on the basis of available data regarding deuterium retention in the materials in question
Original language | English |
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Pages (from-to) | 563-566 |
Number of pages | 4 |
Journal | Journal of surface investigation. X-ray, synchrotron and neutron techniques |
Volume | 4 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2010 |
Keywords
- METIS-270304
- IR-75238