Hydrogen interaction with EUVL-relevant optical materials

Alexey Kuznetsov, Robbert Wilhelmus Elisabeth van de Kruijs, M.A. Gleeson, K. Schmid, Frederik Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)

Abstract

Mo/Si multilayer mirrors were exposed to deuterium ions with well-defined energies in order to gain insight into the effects of Extreme UV light driven plasma generation on reflective elements in commercial lithography equipment. Post-irradiation analysis by Rutherford Backscattering Spectrometry showed erosion of both Mo and Si layers for the highest energy 50 eV/D and exposure time 5.4 × 104 s. Nuclear Reaction Analysis revealed detectable deuterium retention for energies ⩾25 eV/D. Surface analysis by X-ray Photoelectron Spectroscopy showed erosion of the first Si layer for energies ⩾5 eV/D. Inferences on the spatial distribution of trapped deuterium are made on the basis of available data regarding deuterium retention in the materials in question
Original languageEnglish
Pages (from-to)563-566
Number of pages4
JournalJournal of surface investigation. X-ray, synchrotron and neutron techniques
Volume4
Issue number4
DOIs
Publication statusPublished - 2010

Keywords

  • METIS-270304
  • IR-75238

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