Impact of acoustical reflections on megasonic cleaning performance

S. Brems; M. Hauptmann; E. Camerotto; A. Pacco; S. Haider; A. Zijlstra; G. Doumen; T. Bearda; P.W. Mertens

doi:10.1149/1.3202665

Impact of acoustical reflections on megasonic cleaning performance

S. Brems
, M. Hauptmann
, E. Camerotto
, A. Pacco
, S. Haider
, A. Zijlstra
, G. Doumen
, T. Bearda
, P.W. Mertens

Physics of Fluids

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

2 Citations (Scopus)

11 Downloads (Pure)

Abstract

Electrical measurements have shown a direct impact of reflection of acoustic waves back into a transducer. Impedance measurements illustrate in specific cases the existence of multiple resonance peaks when reflected acoustic waves are present. Current and voltage measurements have confirmed this result. From these results, one can already conclude that acoustic reflections have a large impact on the operation of a transducer. Furthermore, it is shown that for megasonic cleaning tools with a face-to-face configuration of transducer and wafer, a precise control over the distance (control over the reflections) between the transducer and wafer is very important. Particle Removal Efficiency (PRE) measurements immediately show a major dependence on the position of the wafer. The PRE dependence is directly linked to the forward power consumed by the transducer, which is largely influenced by the position of the wafer or, in other words, by the reflection of acoustic waves.

Original language	English
Title of host publication	Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
Editors	T. Hattori, J. Ruzyllo, R. Novak, P. Mertens, P. Besson
Publisher	Electrochemical Society
Pages	287-294
Number of pages	8
Edition	5
ISBN (Electronic)	9781607680925
ISBN (Print)	9781566777421
DOIs	https://doi.org/10.1149/1.3202665
Publication status	Published - 2009
Event	11th International Symposium on Semiconductor Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 2009 - Vienna, Austria Duration: 4 Oct 2009 → 9 Oct 2009 Conference number: 11

Publication series

Name	ECS Transactions
Number	5
Volume	25
ISSN (Print)	1938-5862
ISSN (Electronic)	1938-6737

Conference

Conference	11th International Symposium on Semiconductor Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 2009
Country/Territory	Austria
City	Vienna
Period	4/10/09 → 9/10/09
Other	216th ECS Meeting

Keywords

METIS-266333
IR-73217

Access to Document

10.1149/1.3202665

Cite this

Brems, S., Hauptmann, M., Camerotto, E., Pacco, A., Haider, S., Zijlstra, A., Doumen, G., Bearda, T., & Mertens, P. W. (2009). Impact of acoustical reflections on megasonic cleaning performance. In T. Hattori, J. Ruzyllo, R. Novak, P. Mertens, & P. Besson (Eds.), Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11 (5 ed., pp. 287-294). (ECS Transactions; Vol. 25, No. 5). Electrochemical Society. https://doi.org/10.1149/1.3202665

@inproceedings{80e84578e71049cdbd37b91884a4426d,

title = "Impact of acoustical reflections on megasonic cleaning performance",

abstract = "Electrical measurements have shown a direct impact of reflection of acoustic waves back into a transducer. Impedance measurements illustrate in specific cases the existence of multiple resonance peaks when reflected acoustic waves are present. Current and voltage measurements have confirmed this result. From these results, one can already conclude that acoustic reflections have a large impact on the operation of a transducer. Furthermore, it is shown that for megasonic cleaning tools with a face-to-face configuration of transducer and wafer, a precise control over the distance (control over the reflections) between the transducer and wafer is very important. Particle Removal Efficiency (PRE) measurements immediately show a major dependence on the position of the wafer. The PRE dependence is directly linked to the forward power consumed by the transducer, which is largely influenced by the position of the wafer or, in other words, by the reflection of acoustic waves.",

keywords = "METIS-266333, IR-73217",

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booktitle = "Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11",

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Brems, S, Hauptmann, M, Camerotto, E, Pacco, A, Haider, S, Zijlstra, A, Doumen, G, Bearda, T & Mertens, PW 2009, Impact of acoustical reflections on megasonic cleaning performance. in T Hattori, J Ruzyllo, R Novak, P Mertens & P Besson (eds), Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11. 5 edn, ECS Transactions, no. 5, vol. 25, Electrochemical Society, pp. 287-294, 11th International Symposium on Semiconductor Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 2009, Vienna, Austria, 4/10/09. https://doi.org/10.1149/1.3202665

Impact of acoustical reflections on megasonic cleaning performance. / Brems, S.; Hauptmann, M.; Camerotto, E. et al.
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11. ed. / T. Hattori; J. Ruzyllo; R. Novak; P. Mertens; P. Besson. 5. ed. Electrochemical Society, 2009. p. 287-294 (ECS Transactions; Vol. 25, No. 5).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Impact of acoustical reflections on megasonic cleaning performance

AU - Brems, S.

AU - Hauptmann, M.

AU - Camerotto, E.

AU - Pacco, A.

AU - Haider, S.

AU - Zijlstra, A.

AU - Doumen, G.

AU - Bearda, T.

AU - Mertens, P.W.

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N2 - Electrical measurements have shown a direct impact of reflection of acoustic waves back into a transducer. Impedance measurements illustrate in specific cases the existence of multiple resonance peaks when reflected acoustic waves are present. Current and voltage measurements have confirmed this result. From these results, one can already conclude that acoustic reflections have a large impact on the operation of a transducer. Furthermore, it is shown that for megasonic cleaning tools with a face-to-face configuration of transducer and wafer, a precise control over the distance (control over the reflections) between the transducer and wafer is very important. Particle Removal Efficiency (PRE) measurements immediately show a major dependence on the position of the wafer. The PRE dependence is directly linked to the forward power consumed by the transducer, which is largely influenced by the position of the wafer or, in other words, by the reflection of acoustic waves.

AB - Electrical measurements have shown a direct impact of reflection of acoustic waves back into a transducer. Impedance measurements illustrate in specific cases the existence of multiple resonance peaks when reflected acoustic waves are present. Current and voltage measurements have confirmed this result. From these results, one can already conclude that acoustic reflections have a large impact on the operation of a transducer. Furthermore, it is shown that for megasonic cleaning tools with a face-to-face configuration of transducer and wafer, a precise control over the distance (control over the reflections) between the transducer and wafer is very important. Particle Removal Efficiency (PRE) measurements immediately show a major dependence on the position of the wafer. The PRE dependence is directly linked to the forward power consumed by the transducer, which is largely influenced by the position of the wafer or, in other words, by the reflection of acoustic waves.

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BT - Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11

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A2 - Mertens, P.

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ER -

Brems S, Hauptmann M, Camerotto E, Pacco A, Haider S, Zijlstra A et al. Impact of acoustical reflections on megasonic cleaning performance. In Hattori T, Ruzyllo J, Novak R, Mertens P, Besson P, editors, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11. 5 ed. Electrochemical Society. 2009. p. 287-294. (ECS Transactions; 5). doi: 10.1149/1.3202665

Impact of acoustical reflections on megasonic cleaning performance

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