Abstract
This letter reports the diagnostic power of the low-frequency noise analysis (steady-state and periodic large-signal excitation) in MOSFETs subjected to hot-carrier degradation. The LF noise under periodic large-signal excitation is shown to increase more rapidly than the LF noise in steady-state. Moreover the improvement in the LF noise performance due to periodic large-signal excitation, observed for fresh devices, gradually diminishes as the devices are subjected to hot-carrier stress.
Original language | English |
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Pages (from-to) | 764-766 |
Number of pages | 3 |
Journal | IEEE electron device letters |
Volume | 26 |
Issue number | 10 |
DOIs | |
Publication status | Published - 1 Oct 2005 |
Keywords
- Periodic large-signal excitation
- Low frequency noise
- Hot-carrier degradation
- MOSFETs