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Impact of ion implantation statistics on VT fluctuations in MOSFETs: Comparison between decaborane and boron channel implants
Hans Tuinhout*, Frans Widdershoven, Peter Stolk, Jurriaan Schmitz, Bert Dirks, Karel van der Tak, Pascal Bancken, Jarich Politiek
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
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