Impact of nano particles on semiconductor manufacturing

F. Wali, D.M. Knotter, F.G. Kuper

    Research output: Contribution to conferencePaperAcademicpeer-review

    2 Citations (Scopus)

    Abstract

    Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nanoparticle present in ultra pure water on yield of up to 4-6 % has been found in two different products.
    Original languageUndefined
    Pages97-99
    Number of pages3
    DOIs
    Publication statusPublished - 23 Dec 2008
    EventProceedings of 12th IEEE International Multitopic Conference (INMIC) 2008 - Karachi
    Duration: 23 Dec 200824 Dec 2008

    Conference

    ConferenceProceedings of 12th IEEE International Multitopic Conference (INMIC) 2008
    Period23/12/0824/12/08
    Other23-24 Dec 2008

    Keywords

    • IR-76701
    • EWI-20028

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