Impacts of Process Conditions on the Uniformity of Material Removal Rate in Chemical Mechanical Polishing Process

V. Nguyen Hoang, H. van Kranenburg, P. van der Velden, R. Daamen, P.H. Woerlee

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of SAFE conference 2000
Place of Publication	Veldhoven, The Netherlands
Pages	107-111
Publication status	Published - 29 Nov 2000

Keywords

@inproceedings{e81189d7f3844ed3998f1aac4163480f,

title = "Impacts of Process Conditions on the Uniformity of Material Removal Rate in Chemical Mechanical Polishing Process",

keywords = "METIS-113951",

author = "{Nguyen Hoang}, V. and {van Kranenburg}, H. and {van der Velden}, P. and R. Daamen and P.H. Woerlee",

year = "2000",

month = nov,

day = "29",

language = "Undefined",

isbn = "9073461243",

pages = "107--111",

booktitle = "Proceedings of SAFE conference 2000",

}

Impacts of Process Conditions on the Uniformity of Material Removal Rate in Chemical Mechanical Polishing Process. / Nguyen Hoang, V.; van Kranenburg, H.; van der Velden, P. et al.
Proceedings of SAFE conference 2000. Veldhoven, The Netherlands, 2000. p. 107-111.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Impacts of Process Conditions on the Uniformity of Material Removal Rate in Chemical Mechanical Polishing Process

AU - Nguyen Hoang, V.

AU - van Kranenburg, H.

AU - van der Velden, P.

AU - Daamen, R.

AU - Woerlee, P.H.

PY - 2000/11/29

Y1 - 2000/11/29

KW - METIS-113951

M3 - Conference contribution

SN - 9073461243

SP - 107

EP - 111

BT - Proceedings of SAFE conference 2000

CY - Veldhoven, The Netherlands

ER -