Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

12 Citations (Scopus)

Abstract

We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm
Original languageEnglish
Title of host publicationProceedings of SPIE, The International Society for Optical Engineering
EditorsFrank M. Schellenberg, Bruno M. La Fontaine
Place of PublicationSan Jose, CA, USA
PublisherSPIE
Pages72713V-
ISBN (Print)9780819475244
DOIs
Publication statusPublished - 24 Feb 2009
EventSPIE Advanced Lithography 2009 - San Jose Convention Center, San Jose, United States
Duration: 22 Feb 200927 Feb 2009

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume7271
ISSN (Print)0277-786X

Conference

ConferenceSPIE Advanced Lithography 2009
CountryUnited States
CitySan Jose
Period22/02/0927/02/09

Fingerprint

optics
reflectance
photolithography
passivity
interlayers
incidence
wavelengths

Keywords

  • XPS
  • METIS-266558
  • nitridation
  • IR-77754
  • Reflectometry
  • B4C/La
  • Lithography
  • Multilayer

Cite this

Tsarfati, T., Zoethout, E., Louis, E., van de Kruijs, R. W. E., Yakshin, A., Müllender, S., & Bijkerk, F. (2009). Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV. In F. M. Schellenberg, & B. M. La Fontaine (Eds.), Proceedings of SPIE, The International Society for Optical Engineering (pp. 72713V-). (Proceedings of SPIE; Vol. 7271). San Jose, CA, USA: SPIE. https://doi.org/10.1117/12.824434
Tsarfati, T. ; Zoethout, E. ; Louis, Eric ; van de Kruijs, Robbert Wilhelmus Elisabeth ; Yakshin, Andrey ; Müllender, Stephan ; Bijkerk, Frederik. / Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV. Proceedings of SPIE, The International Society for Optical Engineering. editor / Frank M. Schellenberg ; Bruno M. La Fontaine. San Jose, CA, USA : SPIE, 2009. pp. 72713V- (Proceedings of SPIE).
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title = "Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV",
abstract = "We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20{\%} for 200 period multilayers, with a best-so-far result of 41.5 {\%} at near-normal incidence of 6.7 nm",
keywords = "XPS, METIS-266558, nitridation, IR-77754, Reflectometry, B4C/La, Lithography, Multilayer",
author = "T. Tsarfati and E. Zoethout and Eric Louis and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and Andrey Yakshin and Stephan M{\"u}llender and Frederik Bijkerk",
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Tsarfati, T, Zoethout, E, Louis, E, van de Kruijs, RWE, Yakshin, A, Müllender, S & Bijkerk, F 2009, Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV. in FM Schellenberg & BM La Fontaine (eds), Proceedings of SPIE, The International Society for Optical Engineering. Proceedings of SPIE, vol. 7271, SPIE, San Jose, CA, USA, pp. 72713V-, SPIE Advanced Lithography 2009, San Jose, United States, 22/02/09. https://doi.org/10.1117/12.824434

Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV. / Tsarfati, T.; Zoethout, E.; Louis, Eric; van de Kruijs, Robbert Wilhelmus Elisabeth; Yakshin, Andrey; Müllender, Stephan; Bijkerk, Frederik.

Proceedings of SPIE, The International Society for Optical Engineering. ed. / Frank M. Schellenberg; Bruno M. La Fontaine. San Jose, CA, USA : SPIE, 2009. p. 72713V- (Proceedings of SPIE; Vol. 7271).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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T1 - Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV

AU - Tsarfati, T.

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AU - Louis, Eric

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Yakshin, Andrey

AU - Müllender, Stephan

AU - Bijkerk, Frederik

PY - 2009/2/24

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N2 - We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm

AB - We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm

KW - XPS

KW - METIS-266558

KW - nitridation

KW - IR-77754

KW - Reflectometry

KW - B4C/La

KW - Lithography

KW - Multilayer

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DO - 10.1117/12.824434

M3 - Conference contribution

SN - 9780819475244

T3 - Proceedings of SPIE

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BT - Proceedings of SPIE, The International Society for Optical Engineering

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A2 - La Fontaine, Bruno M.

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Tsarfati T, Zoethout E, Louis E, van de Kruijs RWE, Yakshin A, Müllender S et al. Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV. In Schellenberg FM, La Fontaine BM, editors, Proceedings of SPIE, The International Society for Optical Engineering. San Jose, CA, USA: SPIE. 2009. p. 72713V-. (Proceedings of SPIE). https://doi.org/10.1117/12.824434