Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV

T. Tsarfati, E. Zoethout, Eric Louis, Robbert Wilhelmus Elisabeth van de Kruijs, Andrey Yakshin, Stephan Müllender, Frederik Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

14 Citations (Scopus)

Abstract

We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm
Original languageEnglish
Title of host publicationProceedings of SPIE, The International Society for Optical Engineering
EditorsFrank M. Schellenberg, Bruno M. La Fontaine
Place of PublicationSan Jose, CA, USA
PublisherSPIE
Pages72713V-
ISBN (Print)9780819475244
DOIs
Publication statusPublished - 24 Feb 2009
EventSPIE Advanced Lithography 2009 - San Jose Convention Center, San Jose, United States
Duration: 22 Feb 200927 Feb 2009

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume7271
ISSN (Print)0277-786X

Conference

ConferenceSPIE Advanced Lithography 2009
CountryUnited States
CitySan Jose
Period22/02/0927/02/09

Keywords

  • XPS
  • METIS-266558
  • nitridation
  • IR-77754
  • Reflectometry
  • B4C/La
  • Lithography
  • Multilayer

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