@inproceedings{049746e44ca7410a855a2ba9ad443907,
title = "Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV",
abstract = "We present a computational and experimental study on interface passivation of B4C/La multilayers for photolithography at wavelengths beyond 13.5 nm. We successfully applied N-plasma treatment to form interface-localized BN and LaN layers, preventing LaB6 and LaC2 interlayer formation and increasing the optical contrast. Experiments suggest an improvement of absolute reflection by up to 20% for 200 period multilayers, with a best-so-far result of 41.5 % at near-normal incidence of 6.7 nm",
keywords = "XPS, Nitridation, Reflectometry, B4C/La, Lithography, Multilayer, 2023 OA procedure",
author = "Tim Tsarfati and Erwin Zoethout and Eric Louis and {van de Kruijs}, Robbert and Andrey Yakshin and Stephan M{\"u}llender and Fred Bijkerk",
year = "2009",
month = feb,
day = "24",
doi = "10.1117/12.824434",
language = "English",
isbn = "9780819475244",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "Schellenberg, {Frank M.} and {La Fontaine}, {Bruno M.}",
booktitle = "Proceedings of SPIE, The International Society for Optical Engineering",
address = "United States",
note = "SPIE Advanced Lithography 2009 ; Conference date: 22-02-2009 Through 27-02-2009",
}