Improved PISO algorithms for modeling density varying flow in conjugate fluid–porous domains

M. Nordlund, M. Staniç, Arkadiusz K. Kuczaj, E.M.A. Frederix, Bernardus J. Geurts

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    Abstract

    Two modified segregated PISO algorithms are proposed, which are constructed to avoid the development of spurious oscillations in the computed flow near sharp interfaces of conjugate fluid–porous domains. The new collocated finite volume algorithms modify the Rhie–Chow interpolation to maintain a correct pressure–velocity coupling when large discontinuous momentum sources associated with jumps in the local permeability and porosity are present. The Re-Distributed Resistivity (RDR) algorithm is based on spreading flow resistivity over the grid cells neighboring a discontinuity in material properties of the porous medium. The Face Consistent Pressure (FCP) approach derives an auxiliary pressure value at the fluid–porous interface using momentum balance around the interface. Such derived pressure correction is designed to avoid spurious oscillations as would otherwise arise with a strictly central discretization. The proposed algorithms are successfully compared against published data for the velocity and pressure for two reference cases of viscous flow. The robustness of the proposed algorithms is additionally demonstrated for strongly reduced viscosity, i.e., higher Reynolds number flows and low Darcy numbers, i.e., low permeability of the porous regions in the domain, for which solutions without unphysical oscillations are computed. Both RDR and FCP are found to accurately represent porous media flow near discontinuities in material properties on structured grids.
    Original languageUndefined
    Pages (from-to)199-215
    Number of pages17
    JournalJournal of computational physics
    Volume306
    DOIs
    Publication statusPublished - Feb 2016

    Keywords

    • EWI-26516
    • Spurious oscillations
    • PISO
    • Porous
    • IR-99456
    • Finite volume method
    • Rhie–Chow
    • Segregated
    • METIS-316022
    • Collocated

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