Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings

R. van der Meer; B. Krishnan; I.V. Kozhevnikov; M.J. de Boer; B. Vratzov; H.M.J. Bastiaens; J. Huskens; W.G. van der Wiel; P.E. Hegeman; G.C.S. Brons; K.-J. Boller; F. Bijkerk

doi:10.1117/12.892687

Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings

R. van der Meer, B. Krishnan, I.V. Kozhevnikov, M.J. de Boer, B. Vratzov, H.M.J. Bastiaens, J. Huskens, W.G. van der Wiel, P.E. Hegeman, G.C.S. Brons, K.-J. Boller, F. Bijkerk

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

12 Citations (Scopus)

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Abstract

Lamellar Multilayer Gratings (LMG) offer improved resolution for soft-x-ray (SXR) monochromatization, while maintaining a high reflection efficiency in comparison to conventional multilayer mirrors (MM). We previously used a Coupled-Waves Approach (CWA) to calculate SXR diffraction by LMGs and identified a single-order regime in which the incident wave only excites a single diffraction order. We showed that in this regime the angular width of the zeroth-order diffraction peak simply scales linearly with Γ (lamel-to-period ratio) without loss of peak reflectivity. However, the number of bi-layers must then be increased by a factor of 1/Γ. Optimal LMG resolution and reflectivity is obtained in this single-order regime, requiring grating periods of only a few hundred nm, lamel widths < 100nm and lamel heights > 1μm [1]. For the fabrication of LMGs with these dimensions, we use a novel process based on UV-NanoImprint Lithography (UV-NIL) and Bosch-type Deep Reactive Ion Etching (DRIE). Successful fabrication of LMGs with periods down to 200nm, line widths of 60nm and multilayer stack heights of 1μm is demonstrated. SXR reflectivity measurements were performed on these LMGs at the PTB beamline at the BESSYII synchrotron facility. The measurements demonstrate an improvement in resolution by a factor 3,5 compared to conventional MMs. Further analysis of the SXR reflectivity measurements is currently being performed.

Original language	English
Title of host publication	Advances in X-ray/EUV Optics and Components VI
Editors	Christian Morawe, Ali M. Khounsary, Shunji Goto
Place of Publication	Bellingham, WA
Publisher	SPIE
Number of pages	8
ISBN (Print)	9780819487490
DOIs	https://doi.org/10.1117/12.892687
Publication status	Published - 22 Aug 2011
Event	SPIE Optical Engineering + Applications 2011 - San Diego Marriott Marquis and Marina, San Diego Convention Center, San Diego, United States Duration: 16 Aug 2011 → 25 Aug 2011

Publication series

Name	Proceedings of SPIE
Publisher	SPIE International
Volume	8139
ISSN (Print)	0277-786X

Conference

Conference	SPIE Optical Engineering + Applications 2011
Country/Territory	United States
City	San Diego
Period	16/08/11 → 25/08/11

Keywords

Bragg reflectors
Lamellar multilayer grating
Soft-X-ray
Coupled waves
UV-NIL
Bosch DRIE

Access to Document

10.1117/12.892687

Cite this

van der Meer, R., Krishnan, B., Kozhevnikov, I. V., de Boer, M. J., Vratzov, B., Bastiaens, H. M. J., Huskens, J., van der Wiel, W. G., Hegeman, P. E., Brons, G. C. S., Boller, K.-J., & Bijkerk, F. (2011). Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings. In C. Morawe, A. M. Khounsary, & S. Goto (Eds.), Advances in X-ray/EUV Optics and Components VI Article 81390Q (Proceedings of SPIE; Vol. 8139). SPIE. https://doi.org/10.1117/12.892687

@inproceedings{d44999f38fbc49a8b70ef10e00f6f7f8,

title = "Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings",

abstract = "Lamellar Multilayer Gratings (LMG) offer improved resolution for soft-x-ray (SXR) monochromatization, while maintaining a high reflection efficiency in comparison to conventional multilayer mirrors (MM). We previously used a Coupled-Waves Approach (CWA) to calculate SXR diffraction by LMGs and identified a single-order regime in which the incident wave only excites a single diffraction order. We showed that in this regime the angular width of the zeroth-order diffraction peak simply scales linearly with Γ (lamel-to-period ratio) without loss of peak reflectivity. However, the number of bi-layers must then be increased by a factor of 1/Γ. Optimal LMG resolution and reflectivity is obtained in this single-order regime, requiring grating periods of only a few hundred nm, lamel widths < 100nm and lamel heights > 1μm [1]. For the fabrication of LMGs with these dimensions, we use a novel process based on UV-NanoImprint Lithography (UV-NIL) and Bosch-type Deep Reactive Ion Etching (DRIE). Successful fabrication of LMGs with periods down to 200nm, line widths of 60nm and multilayer stack heights of 1μm is demonstrated. SXR reflectivity measurements were performed on these LMGs at the PTB beamline at the BESSYII synchrotron facility. The measurements demonstrate an improvement in resolution by a factor 3,5 compared to conventional MMs. Further analysis of the SXR reflectivity measurements is currently being performed.",

keywords = "Bragg reflectors, Lamellar multilayer grating, Soft-X-ray, Coupled waves, UV-NIL, Bosch DRIE",

author = "{van der Meer}, R. and B. Krishnan and I.V. Kozhevnikov and {de Boer}, M.J. and B. Vratzov and H.M.J. Bastiaens and J. Huskens and {van der Wiel}, W.G. and P.E. Hegeman and G.C.S. Brons and K.-J. Boller and F. Bijkerk",

year = "2011",

month = aug,

day = "22",

doi = "10.1117/12.892687",

language = "English",

isbn = "9780819487490",

series = "Proceedings of SPIE",

publisher = "SPIE",

editor = "Christian Morawe and Khounsary, {Ali M.} and Shunji Goto",

booktitle = "Advances in X-ray/EUV Optics and Components VI",

address = "United States",

note = "SPIE Optical Engineering + Applications 2011 ; Conference date: 16-08-2011 Through 25-08-2011",

}

van der Meer, R, Krishnan, B, Kozhevnikov, IV, de Boer, MJ, Vratzov, B, Bastiaens, HMJ, Huskens, J , van der Wiel, WG, Hegeman, PE, Brons, GCS, Boller, K-J & Bijkerk, F 2011, Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings. in C Morawe, AM Khounsary & S Goto (eds), Advances in X-ray/EUV Optics and Components VI., 81390Q, Proceedings of SPIE, vol. 8139, SPIE, Bellingham, WA, SPIE Optical Engineering + Applications 2011, San Diego, United States, 16/08/11. https://doi.org/10.1117/12.892687

Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings. / van der Meer, R.; Krishnan, B.; Kozhevnikov, I.V. et al.
Advances in X-ray/EUV Optics and Components VI. ed. / Christian Morawe; Ali M. Khounsary; Shunji Goto. Bellingham, WA: SPIE, 2011. 81390Q (Proceedings of SPIE; Vol. 8139).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings

AU - van der Meer, R.

AU - Krishnan, B.

AU - Kozhevnikov, I.V.

AU - de Boer, M.J.

AU - Vratzov, B.

AU - Bastiaens, H.M.J.

AU - Huskens, J.

AU - van der Wiel, W.G.

AU - Hegeman, P.E.

AU - Brons, G.C.S.

AU - Boller, K.-J.

AU - Bijkerk, F.

PY - 2011/8/22

Y1 - 2011/8/22

N2 - Lamellar Multilayer Gratings (LMG) offer improved resolution for soft-x-ray (SXR) monochromatization, while maintaining a high reflection efficiency in comparison to conventional multilayer mirrors (MM). We previously used a Coupled-Waves Approach (CWA) to calculate SXR diffraction by LMGs and identified a single-order regime in which the incident wave only excites a single diffraction order. We showed that in this regime the angular width of the zeroth-order diffraction peak simply scales linearly with Γ (lamel-to-period ratio) without loss of peak reflectivity. However, the number of bi-layers must then be increased by a factor of 1/Γ. Optimal LMG resolution and reflectivity is obtained in this single-order regime, requiring grating periods of only a few hundred nm, lamel widths < 100nm and lamel heights > 1μm [1]. For the fabrication of LMGs with these dimensions, we use a novel process based on UV-NanoImprint Lithography (UV-NIL) and Bosch-type Deep Reactive Ion Etching (DRIE). Successful fabrication of LMGs with periods down to 200nm, line widths of 60nm and multilayer stack heights of 1μm is demonstrated. SXR reflectivity measurements were performed on these LMGs at the PTB beamline at the BESSYII synchrotron facility. The measurements demonstrate an improvement in resolution by a factor 3,5 compared to conventional MMs. Further analysis of the SXR reflectivity measurements is currently being performed.

AB - Lamellar Multilayer Gratings (LMG) offer improved resolution for soft-x-ray (SXR) monochromatization, while maintaining a high reflection efficiency in comparison to conventional multilayer mirrors (MM). We previously used a Coupled-Waves Approach (CWA) to calculate SXR diffraction by LMGs and identified a single-order regime in which the incident wave only excites a single diffraction order. We showed that in this regime the angular width of the zeroth-order diffraction peak simply scales linearly with Γ (lamel-to-period ratio) without loss of peak reflectivity. However, the number of bi-layers must then be increased by a factor of 1/Γ. Optimal LMG resolution and reflectivity is obtained in this single-order regime, requiring grating periods of only a few hundred nm, lamel widths < 100nm and lamel heights > 1μm [1]. For the fabrication of LMGs with these dimensions, we use a novel process based on UV-NanoImprint Lithography (UV-NIL) and Bosch-type Deep Reactive Ion Etching (DRIE). Successful fabrication of LMGs with periods down to 200nm, line widths of 60nm and multilayer stack heights of 1μm is demonstrated. SXR reflectivity measurements were performed on these LMGs at the PTB beamline at the BESSYII synchrotron facility. The measurements demonstrate an improvement in resolution by a factor 3,5 compared to conventional MMs. Further analysis of the SXR reflectivity measurements is currently being performed.

KW - Bragg reflectors

KW - Lamellar multilayer grating

KW - Soft-X-ray

KW - Coupled waves

KW - UV-NIL

KW - Bosch DRIE

U2 - 10.1117/12.892687

DO - 10.1117/12.892687

M3 - Conference contribution

SN - 9780819487490

T3 - Proceedings of SPIE

BT - Advances in X-ray/EUV Optics and Components VI

A2 - Morawe, Christian

A2 - Khounsary, Ali M.

A2 - Goto, Shunji

PB - SPIE

CY - Bellingham, WA

T2 - SPIE Optical Engineering + Applications 2011

Y2 - 16 August 2011 through 25 August 2011

ER -

Improved resolution for soft-x-ray monochromatization using lamellar multilayer gratings

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Keywords

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