In depth compositional analysis of ceramic (Bi2O3)0.75(Er2O3)0.25 by AES and XPS

L.J. Hanekamp, Lambertus J. Hanekamp, A.H.J. van den Berg, Albert van den Berg, Henricus J.M. Bouwmeester, Antonius G.B.M. Sasse, H. Kruidhof

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Abstract

The chemical composition of dense ceramics of erbia-stabilized δ-Bi2O3 was analyzed by Auger electron spectroscopy (AES) depth profiling using Ar+ ion sputtering. The relative sensitivity factors (rsf) and sputter rates of bismuth and erbium in this material have been determined by electron probe microanalysis (EPMA) and chemical analysis. These results, supplemented by data from angle resolved X-ray photoelectron spectroscopy (ARXPS), shows a bismuth enrichment at the surface. Evidence has been found for reduction of the bismuth-oxide at the outermost part of the surface layer.
Original languageUndefined
Pages (from-to)189-194
Number of pages0
JournalMicrochimica acta
Volume101
Issue number1-6
DOIs
Publication statusPublished - 1990

Keywords

  • IR-85855
  • Ceramic
  • METIS-128488
  • XPS
  • Sputtering
  • AES

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