Abstract
Imaging and mapping “new” land, species, organisms and processes created
possibilities to manipulate and control them. Microscopes enabled imaging objects
and processes that go beyond the human senses as vision, sense and hearing. This
information is required to understand physical and chemical processes such as
deposition and growth. Currently, there is also a clear need to monitor the
surface morphology during deposition. To image and map (non)conducting
surfaces with atomic resolution, Scanning Force Microscopy (SFM) can be used.
With physical vapor deposition techniques such as Pulsed Laser Deposition
(PLD) thin films of almost any material such as metal oxides can be deposited.
Finding the optimum deposition parameters, for material systems, is traditionally
done by trial and error. This can be a tedious and time-consuming process
especially when information on composition and morphology is lacking during
growth.
Diagnostic information during deposition of materials such as metal oxides is
up to now mostly derived from diffraction methods such as Reflection High
Energy Electron Diffraction (RHEED), Surface X-Ray Diffraction (SXRD) and
Low Energy Electron Diffraction (LEED).
These instruments are based on diffraction and measure the periodic
arrangement of the surface atoms. However, the local surface morphology such as
the island density, the island size distribution and island shapes can not be
directly measured on a microscopic scale as opposed to imaging techniques such
as Scanning Probe Microscopy (SPM). This instrument has a high spatial
resolution, but is usually not combined with deposition techniques and merely
used ex-situ*. This hampers quantitative studies to describe the nucleation and
growth because it is difficult to measure the evolution of the same microscopic
surface location and the surface morphology evolution could be influenced† by the
cooling procedure to room temperature, ambient exposure and ex-situ sample
preparation. This thesis describes a setup for in-situ growth monitoring with SFM
during Pulsed Laser Deposition (PLD).
Original language | English |
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Awarding Institution |
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Supervisors/Advisors |
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Award date | 10 Apr 2008 |
Place of Publication | Enschede |
Publisher | |
Print ISBNs | 978-90-365-2655-5 |
DOIs | |
Publication status | Published - 10 Apr 2008 |
Keywords
- IR-67332