In-situ RHEED Analysis of Atomic Layer Deposition and Characterization of AL203 Gate Dielectrics

R.G. Bankras, Antonius A.I. Aarnink, J. Holleman, Jurriaan Schmitz

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of Semiconductor Advances for Future Electronics SAFE 2003
    Publication statusPublished - 25 Nov 2003


    • METIS-213254

    Cite this