In situ spectroscopic ellipsometry for studying the growth and optical constants of ALD AlN films

Research output: Contribution to journalArticleAcademicpeer-review

1 Downloads (Pure)

Abstract

This work reports on the applications of in situ spectroscopic ellipsometry (SE) in studying the growth characteristics and optical functions of aluminum nitride (AlN) thin films made by atomic layer deposition (ALD). We used SE to measure the film thickness in real-time during the deposition, and to study the growth rate and the self-limiting reaction of the ALD growth mode. The Cauchy-Urbach model was applied to parameterize and study the evolution of the refractive index, n, and extinction coefficient, k, of the AlN layers during growth. We observed a strong thickness dependence of the optical constants.
Original languageUndefined
Pages (from-to)24-31
Number of pages8
JournalNEVAC blad
Volume51
Issue number3
Publication statusPublished - 1 Nov 2013

Keywords

  • EWI-24056
  • IR-88175
  • METIS-300199

Cite this

@article{833f1e52ec6a40628ea85ee9068db073,
title = "In situ spectroscopic ellipsometry for studying the growth and optical constants of ALD AlN films",
abstract = "This work reports on the applications of in situ spectroscopic ellipsometry (SE) in studying the growth characteristics and optical functions of aluminum nitride (AlN) thin films made by atomic layer deposition (ALD). We used SE to measure the film thickness in real-time during the deposition, and to study the growth rate and the self-limiting reaction of the ALD growth mode. The Cauchy-Urbach model was applied to parameterize and study the evolution of the refractive index, n, and extinction coefficient, k, of the AlN layers during growth. We observed a strong thickness dependence of the optical constants.",
keywords = "EWI-24056, IR-88175, METIS-300199",
author = "{Van Hao}, B. and Aarnink, {Antonius A.I.} and Kovalgin, {Alexeij Y.} and {de Jong}, {Machiel Pieter}",
note = "eemcs-eprint-24056",
year = "2013",
month = "11",
day = "1",
language = "Undefined",
volume = "51",
pages = "24--31",
journal = "NEVAC blad",
issn = "0169-9431",
publisher = "Nederlandse Vacuumvereniging",
number = "3",

}

In situ spectroscopic ellipsometry for studying the growth and optical constants of ALD AlN films. / Van Hao, B.; Aarnink, Antonius A.I.; Kovalgin, Alexeij Y.; de Jong, Machiel Pieter.

In: NEVAC blad, Vol. 51, No. 3, 01.11.2013, p. 24-31.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - In situ spectroscopic ellipsometry for studying the growth and optical constants of ALD AlN films

AU - Van Hao, B.

AU - Aarnink, Antonius A.I.

AU - Kovalgin, Alexeij Y.

AU - de Jong, Machiel Pieter

N1 - eemcs-eprint-24056

PY - 2013/11/1

Y1 - 2013/11/1

N2 - This work reports on the applications of in situ spectroscopic ellipsometry (SE) in studying the growth characteristics and optical functions of aluminum nitride (AlN) thin films made by atomic layer deposition (ALD). We used SE to measure the film thickness in real-time during the deposition, and to study the growth rate and the self-limiting reaction of the ALD growth mode. The Cauchy-Urbach model was applied to parameterize and study the evolution of the refractive index, n, and extinction coefficient, k, of the AlN layers during growth. We observed a strong thickness dependence of the optical constants.

AB - This work reports on the applications of in situ spectroscopic ellipsometry (SE) in studying the growth characteristics and optical functions of aluminum nitride (AlN) thin films made by atomic layer deposition (ALD). We used SE to measure the film thickness in real-time during the deposition, and to study the growth rate and the self-limiting reaction of the ALD growth mode. The Cauchy-Urbach model was applied to parameterize and study the evolution of the refractive index, n, and extinction coefficient, k, of the AlN layers during growth. We observed a strong thickness dependence of the optical constants.

KW - EWI-24056

KW - IR-88175

KW - METIS-300199

M3 - Article

VL - 51

SP - 24

EP - 31

JO - NEVAC blad

JF - NEVAC blad

SN - 0169-9431

IS - 3

ER -