Influence of stochastic contact resistances on coupling losses

E.M.J. Niessen, R.M.J. van Damme

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    In this paper the influence of stochastic contact resistances on coupling losses in cables is determined. The model consists of two parallel strands making contact with each other at several positions. The parallel resistances in the strands are constant. The interstrand contacts can have stochastic values. As time dependent electromagnetic fields induce currents, heat dissipation arizes. The dissipation due to the currents between the strands, defined as coupling losses, is investigated for constant contact resistances as well as for stochastic values. From the analysis, both analytical and numerical, it follows that, for spatially dependent time varying applied magnetic fields, the coupling losses increase when the parallel resistances decrease. Furthermore, it is shown that for smaller contact resistances the relative influence of the stochastic nature of the contact resistances on the coupling losses increases.
    Original languageEnglish
    Title of host publicationAdvances in Cryogenic Engineering
    Subtitle of host publicationMaterials
    EditorsRichard P. Reed, Fred R. Fickett, Leonard T. Summers, M. Stieg
    Place of PublicationBoston, MA
    PublisherSpringer
    Pages529-536
    Number of pages8
    ISBN (Electronic)978-1-4757-9053-5
    ISBN (Print)978-1-4757-9055-9
    DOIs
    Publication statusPublished - 20 Jan 1994
    Event1993 Cryogenic Engineering Conference and International Cryogenic Materials Conference, CEC/ICMC 1993 - Albuquerque, United States
    Duration: 12 Jul 199316 Jul 1993

    Publication series

    NameAn International Cryogenic Materials Conference Publication
    PublisherSpringer
    Volume40
    ISSN (Print)0065-2482

    Conference

    Conference1993 Cryogenic Engineering Conference and International Cryogenic Materials Conference, CEC/ICMC 1993
    Abbreviated titleCEC/ICMC
    CountryUnited States
    CityAlbuquerque
    Period12/07/9316/07/93

    Keywords

    • Contact resistance
    • Inverse Fourier transform
    • Stochastic nature
    • Loss term
    • Stochastic average

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