Influence of the oxidation state of SrTiO3 plasmas for stoichiometric growth of pulsed laser deposition films identified by laser induced fluorescence

Kasper Orsel; Bert M.J. Bastiaens; Rik Groenen; Gertjan Koster; Guus Rijnders; Klaus J. Boller

doi:10.1063/1.4933217

Influence of the oxidation state of SrTiO3 plasmas for stoichiometric growth of pulsed laser deposition films identified by laser induced fluorescence

Kasper Orsel, Bert M.J. Bastiaens, Rik Groenen, Gertjan Koster, Guus Rijnders, Klaus J. Boller

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Abstract

By applying two-dimensional laser induced fluorescence (LIF) on multiple plasma constituents, we are able to directly link the oxidation of plasma species in a SrTiO3 plasma for pulsed laser deposition to the stoichiometry and quality of the thin films grown. With spatiotemporal LIF mapping of the plasma species in different background gas compositions, we find that Ti and Sr have to be fully oxidized for a stoichiometric growth of crystalline thin films, which gives new input for modeling surface growth, as well as provides additional control over the exact degree of stoichiometry of thin films.

Original language	English
Article number	106103
Journal	APL materials
Volume	3
Issue number	10
DOIs	https://doi.org/10.1063/1.4933217
Publication status	Published - 2015

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10.1063/1.4933217Licence: CC BY

Orsel2015influenceFinal published version, 1.45 MBLicence: CC BY

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@article{75e110b8e4a04837aa9265d5ca2008d8,

title = "Influence of the oxidation state of SrTiO3 plasmas for stoichiometric growth of pulsed laser deposition films identified by laser induced fluorescence",

abstract = "By applying two-dimensional laser induced fluorescence (LIF) on multiple plasma constituents, we are able to directly link the oxidation of plasma species in a SrTiO3 plasma for pulsed laser deposition to the stoichiometry and quality of the thin films grown. With spatiotemporal LIF mapping of the plasma species in different background gas compositions, we find that Ti and Sr have to be fully oxidized for a stoichiometric growth of crystalline thin films, which gives new input for modeling surface growth, as well as provides additional control over the exact degree of stoichiometry of thin films.",

author = "Kasper Orsel and Bastiaens, {Bert M.J.} and Rik Groenen and Gertjan Koster and Guus Rijnders and Boller, {Klaus J.}",

year = "2015",

doi = "10.1063/1.4933217",

language = "English",

volume = "3",

journal = "APL materials",

issn = "2166-532X",

publisher = "American Institute of Physics",

number = "10",

}

TY - JOUR

T1 - Influence of the oxidation state of SrTiO3 plasmas for stoichiometric growth of pulsed laser deposition films identified by laser induced fluorescence

AU - Orsel, Kasper

AU - Bastiaens, Bert M.J.

AU - Groenen, Rik

AU - Koster, Gertjan

AU - Rijnders, Guus

AU - Boller, Klaus J.

PY - 2015

Y1 - 2015

N2 - By applying two-dimensional laser induced fluorescence (LIF) on multiple plasma constituents, we are able to directly link the oxidation of plasma species in a SrTiO3 plasma for pulsed laser deposition to the stoichiometry and quality of the thin films grown. With spatiotemporal LIF mapping of the plasma species in different background gas compositions, we find that Ti and Sr have to be fully oxidized for a stoichiometric growth of crystalline thin films, which gives new input for modeling surface growth, as well as provides additional control over the exact degree of stoichiometry of thin films.

AB - By applying two-dimensional laser induced fluorescence (LIF) on multiple plasma constituents, we are able to directly link the oxidation of plasma species in a SrTiO3 plasma for pulsed laser deposition to the stoichiometry and quality of the thin films grown. With spatiotemporal LIF mapping of the plasma species in different background gas compositions, we find that Ti and Sr have to be fully oxidized for a stoichiometric growth of crystalline thin films, which gives new input for modeling surface growth, as well as provides additional control over the exact degree of stoichiometry of thin films.

U2 - 10.1063/1.4933217

DO - 10.1063/1.4933217

M3 - Article

SN - 2166-532X

VL - 3

JO - APL materials

JF - APL materials

IS - 10

M1 - 106103

ER -

Influence of the oxidation state of SrTiO3 plasmas for stoichiometric growth of pulsed laser deposition films identified by laser induced fluorescence

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