Influence of thin film nickel pretreatment on catalytic thermal chemical vapor deposition of carbon nanofibers

Roald M. Tiggelaar, D.B. Thakur, H. Nair, Leonardus Lefferts, Kulathuiyer Seshan, Johannes G.E. Gardeniers

Research output: Contribution to journalArticleAcademicpeer-review

5 Citations (Scopus)

Abstract

Nickel and other metal nanoparticles are known to be active as catalysts in the synthesis of carbon nanofibers. In this paper we investigate how dewetting and break-up of nickel thin films depends on film thickness, film–substrate interaction and pretreatment conditions. This is evaluated for films evaporated on oxidized silicon and fused silica substrates with or without tantalum coating, which were subsequently exposed to different pretreatment atmospheres (vacuum, nitrogen, air and hydrogen; 1 h, 650 °C). Atomic force microscopy, scanning electron microscopy and energy dispersive X-ray analysis were used to characterize the films. Pretreated Ni films were subjected to a thermal catalytic chemical vapor deposition procedure with brief ethylene exposures (0.5–3 min, 635 °C). It was found that only on the spherical nanoparticles originating from a hydrogen pretreatment of a Ni film with Ta adhesion layer, homogeneously distributed, randomly-oriented, well-attached, and semi-crystalline carbon nanofibers be synthesized
Original languageEnglish
Pages (from-to)341-347
JournalThin solid films
Volume534
DOIs
Publication statusPublished - 2013

Keywords

  • IR-85514
  • METIS-295349

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