Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors

Research output: Contribution to conferencePoster

Original languageEnglish
Pages-
Publication statusPublished - 6 Oct 2013
Event2013 International Symposium on Extreme Ultraviolet Lithography - Toyama, Japan
Duration: 6 Oct 201310 Oct 2013

Conference

Conference2013 International Symposium on Extreme Ultraviolet Lithography
CountryJapan
CityToyama
Period6/10/1310/10/13

Keywords

  • METIS-299689

Cite this

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E., & Bijkerk, F. (2013). Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors. -. Poster session presented at 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan.