Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors

Viacheslav Medvedev; Andrey Yakshin; Robbert Wilhelmus Elisabeth van de Kruijs; V.M. Krivtsun; Eric Louis; Frederik Bijkerk

Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, Eric Louis, Frederik Bijkerk

XUV Optics

Research output: Contribution to conference › Poster › Other research output

Original language	English
Pages	-
Publication status	Published - 6 Oct 2013
Event	2013 International Symposium on Extreme Ultraviolet Lithography - Toyama, Japan Duration: 6 Oct 2013 → 10 Oct 2013

Conference

Conference	2013 International Symposium on Extreme Ultraviolet Lithography
Abbreviated title	EUV Litography
Country/Territory	Japan
City	Toyama
Period	6/10/13 → 10/10/13

Keywords

METIS-299689

Cite this

@conference{607954bc08fd477c859acb0a7a140469,

title = "Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors",

keywords = "METIS-299689",

author = "Viacheslav Medvedev and Andrey Yakshin and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and V.M. Krivtsun and Eric Louis and Frederik Bijkerk",

year = "2013",

month = oct,

day = "6",

language = "English",

pages = "--",

note = "2013 International Symposium on Extreme Ultraviolet Lithography, EUV Litography ; Conference date: 06-10-2013 Through 10-10-2013",

}

TY - CONF

T1 - Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors

AU - Medvedev, Viacheslav

AU - Yakshin, Andrey

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Krivtsun, V.M.

AU - Louis, Eric

AU - Bijkerk, Frederik

PY - 2013/10/6

Y1 - 2013/10/6

KW - METIS-299689

M3 - Poster

SP - -

T2 - 2013 International Symposium on Extreme Ultraviolet Lithography

Y2 - 6 October 2013 through 10 October 2013

ER -