Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, Eric Louis, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output

Original languageEnglish
Pages-
Publication statusPublished - 6 Oct 2013
Event2013 International Symposium on Extreme Ultraviolet Lithography - Toyama, Japan
Duration: 6 Oct 201310 Oct 2013

Conference

Conference2013 International Symposium on Extreme Ultraviolet Lithography
Abbreviated titleEUV Litography
CountryJapan
CityToyama
Period6/10/1310/10/13

Keywords

  • METIS-299689

Cite this