Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

Viacheslav Medvedev; Andrey Yakshin; Robbert Wilhelmus Elisabeth van de Kruijs; V.M. Krivtsun; A.M. Yakunin; Frederik Bijkerk

Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, A.M. Yakunin, Frederik Bijkerk

Laser Physics & Nonlinear Optics

Research output: Contribution to conference › Poster › Other research output

Abstract

Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.

Original language	English
Pages	-
Publication status	Published - 17 Jan 2012
Event	Physics@FOM Veldhoven 2012: Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing - NH Koningshof Veldhoven, Veldhoven, Netherlands Duration: 17 Jan 2012 → 18 Jan 2012

Conference

Conference	Physics@FOM Veldhoven 2012
Country/Territory	Netherlands
City	Veldhoven
Period	17/01/12 → 18/01/12

Keywords

METIS-298893

Cite this

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title = "Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures",

abstract = "Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.",

keywords = "METIS-298893",

author = "Viacheslav Medvedev and Andrey Yakshin and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and V.M. Krivtsun and A.M. Yakunin and Frederik Bijkerk",

year = "2012",

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language = "English",

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note = "Physics@FOM Veldhoven 2012 : Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing ; Conference date: 17-01-2012 Through 18-01-2012",

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TY - CONF

T1 - Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

AU - Medvedev, Viacheslav

AU - Yakshin, Andrey

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Krivtsun, V.M.

AU - Yakunin, A.M.

AU - Bijkerk, Frederik

PY - 2012/1/17

Y1 - 2012/1/17

N2 - Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.

AB - Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.

KW - METIS-298893

M3 - Poster

SP - -

T2 - Physics@FOM Veldhoven 2012

Y2 - 17 January 2012 through 18 January 2012

ER -

Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

Abstract

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Keywords

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