Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, A.M. Yakunin, Frederik Bijkerk

Research output: Contribution to conferencePoster

Abstract

Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.
Original languageEnglish
Pages-
Publication statusPublished - 17 Jan 2012
EventPhysics@FOM Veldhoven 2012: Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing - NH Koningshof Veldhoven, Veldhoven, Netherlands
Duration: 17 Jan 201218 Jan 2012

Conference

ConferencePhysics@FOM Veldhoven 2012
CountryNetherlands
CityVeldhoven
Period17/01/1218/01/12

Fingerprint

infrared suppression
retarding
radiation
coatings
laser plasmas
wavelengths
magnetron sputtering
laser beams
reflectance
spectroscopy

Keywords

  • METIS-298893

Cite this

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, A. M., & Bijkerk, F. (2012). Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures. -. Poster session presented at Physics@FOM Veldhoven 2012, Veldhoven, Netherlands.
Medvedev, Viacheslav ; Yakshin, Andrey ; van de Kruijs, Robbert Wilhelmus Elisabeth ; Krivtsun, V.M. ; Yakunin, A.M. ; Bijkerk, Frederik. / Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures. Poster session presented at Physics@FOM Veldhoven 2012, Veldhoven, Netherlands.
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title = "Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures",
abstract = "Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45{\%} of the EUV radiation.",
keywords = "METIS-298893",
author = "Viacheslav Medvedev and Andrey Yakshin and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and V.M. Krivtsun and A.M. Yakunin and Frederik Bijkerk",
year = "2012",
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day = "17",
language = "English",
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note = "Physics@FOM Veldhoven 2012 : Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing ; Conference date: 17-01-2012 Through 18-01-2012",

}

Medvedev, V, Yakshin, A, van de Kruijs, RWE, Krivtsun, VM, Yakunin, AM & Bijkerk, F 2012, 'Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures' Physics@FOM Veldhoven 2012, Veldhoven, Netherlands, 17/01/12 - 18/01/12, pp. -.

Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures. / Medvedev, Viacheslav; Yakshin, Andrey; van de Kruijs, Robbert Wilhelmus Elisabeth; Krivtsun, V.M.; Yakunin, A.M.; Bijkerk, Frederik.

2012. - Poster session presented at Physics@FOM Veldhoven 2012, Veldhoven, Netherlands.

Research output: Contribution to conferencePoster

TY - CONF

T1 - Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

AU - Medvedev, Viacheslav

AU - Yakshin, Andrey

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Krivtsun, V.M.

AU - Yakunin, A.M.

AU - Bijkerk, Frederik

PY - 2012/1/17

Y1 - 2012/1/17

N2 - Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.

AB - Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.

KW - METIS-298893

M3 - Poster

SP - -

ER -

Medvedev V, Yakshin A, van de Kruijs RWE, Krivtsun VM, Yakunin AM, Bijkerk F. Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures. 2012. Poster session presented at Physics@FOM Veldhoven 2012, Veldhoven, Netherlands.