Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, A.M. Yakunin, Frederik Bijkerk

Research output: Contribution to conferencePoster

Abstract

Many optical applications demand high reflectivity in a particular wavelength range and, simultaneously, suppression of radiation outside this prime range. Such parasitic radiation can lead to image distortions in imaging applications, or poor signal-noise ratios in spectroscopy. When working with sources of short-wavelength radiation based on laser-produced plasma, suppression of the scattered laser radiation is required. For these purposes we investigated a possibility to integrate an EUV reflecting multilayer coating with a resonant infrared anti-reflecting coating. Pilot samples manufactured with magnetron sputtering demonstrated 3 orders of magnitude suppression of infrared light while still reflecting 45% of the EUV radiation.
Original languageEnglish
Pages-
Publication statusPublished - 17 Jan 2012
EventPhysics@FOM Veldhoven 2012: Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing - NH Koningshof Veldhoven, Veldhoven, Netherlands
Duration: 17 Jan 201218 Jan 2012

Conference

ConferencePhysics@FOM Veldhoven 2012
CountryNetherlands
CityVeldhoven
Period17/01/1218/01/12

Keywords

  • METIS-298893

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    Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, A. M., & Bijkerk, F. (2012). Infrared suppression by hybrid EUV multilayer - IR lossy etalon structures. -. Poster session presented at Physics@FOM Veldhoven 2012, Veldhoven, Netherlands.