Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing

Jos Benschop, Andre Engelen, Hugo Cramer, Michael Kubis, Paul Hinnen, Hans Van Der Laan, Kaustuve Bhattacharyya, Jan Mulkens

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

23 Citations (Scopus)


The overlay, CDU and focus requirements for the 20nm node can only be met using a holistic lithography approach whereby full use is made of high-order, field-by-field, scanner correction capabilities. An essential element in this approach is a fast, precise and accurate in-line metrology sensor, capable to measure on product. The capabilities of the metrology sensor as well as the impact on overlay, CD and focus will be shared in this paper.

Original languageEnglish
Title of host publicationOptical Microlithography XXVI
Publication statusPublished - 5 Jun 2013
Externally publishedYes
EventOptical Microlithography XXVI - San Jose, United States
Duration: 26 Feb 201328 Feb 2013
Conference number: 26

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferenceOptical Microlithography XXVI
CountryUnited States
CitySan Jose


  • Control
  • Integrated
  • Lithography
  • Metrology

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