Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing

Jos Benschop, Andre Engelen, Hugo Cramer, Michael Kubis, Paul Hinnen, Hans van der Laan, Kaustuve Bhattacharyya, Jan Mulkens

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

24 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing'. Together they form a unique fingerprint.

Engineering

Pharmacology, Toxicology and Pharmaceutical Science