Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing

Jos Benschop, Andre Engelen, Hugo Cramer, Michael Kubis, Paul Hinnen, Hans Van Der Laan, Kaustuve Bhattacharyya, Jan Mulkens

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

23 Citations (Scopus)

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Engineering & Materials Science