Integration of trench isolation technology and plasma release for advanced MEMS design on standard silicon wafers

Edin Sarajlic, Meint J. de Boer, N. Arnal, M. Puech, Gijsbertus J.M. Krijnen, Michael Curt Elwenspoek

    Research output: Contribution to conferencePosterOther research output

    Original languageEnglish
    Pages-
    Publication statusPublished - 2 Oct 2003
    EventMESA+ Day 2003 - University of Twente, Enschede, Netherlands
    Duration: 2 Oct 20032 Oct 2003

    Conference

    ConferenceMESA+ Day 2003
    CountryNetherlands
    CityEnschede
    Period2/10/032/10/03
    Other(MESA+ Meeting/Dag)

    Keywords

    • METIS-216937

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